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近理想二氧化钒薄膜中的相关驱动绝缘-金属转变

Correlation-Driven Insulator-Metal Transition in Near-Ideal Vanadium Dioxide Films.

机构信息

Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, USA.

Department of Physics, Temple University, 1925 North 12th Street, Philadelphia, Pennsylvania 19130, USA.

出版信息

Phys Rev Lett. 2016 Mar 18;116(11):116403. doi: 10.1103/PhysRevLett.116.116403.

Abstract

We use polarization- and temperature-dependent x-ray absorption spectroscopy, in combination with photoelectron microscopy, x-ray diffraction, and electronic transport measurements, to study the driving force behind the insulator-metal transition in VO_{2}. We show that both the collapse of the insulating gap and the concomitant change in crystal symmetry in homogeneously strained single-crystalline VO_{2} films are preceded by the purely electronic softening of Coulomb correlations within V-V singlet dimers. This process starts 7 K (±0.3  K) below the transition temperature, as conventionally defined by electronic transport and x-ray diffraction measurements, and sets the energy scale for driving the near-room-temperature insulator-metal transition in this technologically promising material.

摘要

我们使用偏振和温度依赖的 X 射线吸收光谱,结合光电电子显微镜、X 射线衍射和电子输运测量,研究 VO2 中绝缘-金属转变的驱动力。我们表明,在均匀应变的单晶 VO2 薄膜中,绝缘隙的崩溃以及伴随而来的晶体对称性的变化,都是由 V-V 单重态二聚体中库仑相关的纯电子软化所引发的。这个过程始于转变温度以下 7 K(±0.3 K),正如传统上由电子输运和 X 射线衍射测量定义的那样,并为驱动这种在技术上有前景的材料在近室温下的绝缘-金属转变设定了能量尺度。

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