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采用新型策略实现高性能单层网络结构 ZnO 纳米棒薄膜晶体管。

Adopting Novel Strategies in Achieving High-Performance Single-Layer Network Structured ZnO Nanorods Thin Film Transistors.

机构信息

Department of Materials Science and Engineering, Yonsei University , 50 Yonseiro, Seoul, Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2016 May 11;8(18):11564-74. doi: 10.1021/acsami.5b12321. Epub 2016 Apr 27.

Abstract

High-performance, solution-processed transparent and flexible zinc oxide (ZnO) nanorods (NRs)-based single layer network structured thin film transistors (TFTs) were developed on polyethylene terephthalate (PET) substrate at 100 °C. Keeping the process-temperature under 100 °C, we have improved the device performance by introducing three low temperature-based techniques; regrowing ZnO to fill the void spaces in a single layer network of ZnO NRs, passivating the back channel with polymer, and adopting ZrO2 as the high-k dielectric. Notably, high-k amorphous ZrO2 was synthesized and deposited using a novel method at an unprecedented temperature of 100 °C. Using these methods, the TFTs exhibited a high mobility of 1.77 cm(2)/V·s. An insignificant reduction of 2.18% in mobility value after 3000 cycles of dynamic bending at a radius of curvature of 20 mm indicated the robust mechanical nature of the flexible ZnO NRs SLNS TFTs.

摘要

在聚对苯二甲酸乙二醇酯(PET)衬底上,在 100°C 下开发了基于高性能、溶液处理的透明且柔性氧化锌(ZnO)纳米棒(NR)的单层网络结构薄膜晶体管(TFT)。为了将工艺温度控制在 100°C 以下,我们通过引入三种低温技术来改善器件性能:用 ZnO 重新生长来填充 ZnO NR 单层网络中的空隙,用聚合物钝化背沟道,以及采用 ZrO2 作为高介电常数材料。值得注意的是,高介电常数非晶态 ZrO2 是使用一种新颖的方法在前所未有的 100°C 温度下合成和沉积的。使用这些方法,TFT 表现出 1.77 cm2/V·s 的高迁移率。在曲率半径为 20mm 的情况下进行 3000 次动态弯曲后,迁移率值仅下降了 2.18%,这表明了柔性 ZnO NRs SLNS TFT 的稳健机械特性。

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