Lu Bing-Rui, Xu Chen, Liao Jianfeng, Liu Jianpeng, Chen Yifang
Opt Lett. 2016 Apr 1;41(7):1400-3. doi: 10.1364/OL.41.001400.
We present transmissive plasmonic structural colors from subwavelength nanohole arrays with bottom metal disks for scaled-up manufacturing by nanoimprint lithography (NIL). Comprehensive theoretical and experimental studies are carried out to understand the specific extraordinary optical transmission behavior of the structures with such bottom metal disks. Distinctive colors covering the entire visible spectrum can be generated by changing the structural dimensions of hole arrays in Ag covered by the metal disks. The plasmonic energy hybridization theory is applied to explain the unstable color output with shallow holes so that a large processing window during NIL could be achieved for mass production. A high-resolution of 127,000 dots per inch is demonstrated with potential applications, including color filters and displays, high-resolution color printing, CMOS color imaging, and anti-counterfeiting.
我们展示了具有底部金属圆盘的亚波长纳米孔阵列产生的透射型等离子体结构色，可通过纳米压印光刻（NIL）进行大规模制造。开展了全面的理论和实验研究，以了解具有此类底部金属圆盘的结构的特定超常光学传输行为。通过改变金属圆盘覆盖的银中孔阵列的结构尺寸，可以产生覆盖整个可见光谱的独特颜色。应用等离子体能量杂交理论来解释浅孔时不稳定的颜色输出，从而在纳米压印光刻过程中实现较大的加工窗口以进行大规模生产。展示了每英寸127,000点的高分辨率，其潜在应用包括彩色滤光片和显示器、高分辨率彩色印刷、CMOS彩色成像以及防伪。
