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铁电薄膜中畴壁的微波交流电导率。

Microwave a.c. conductivity of domain walls in ferroelectric thin films.

机构信息

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA.

State Key Laboratory for Low-Dimensional Quantum Physics, Department of Physics and Collaborative Innovation Center for Quantum Matter, Tsinghua University, Beijing 100084, China.

出版信息

Nat Commun. 2016 May 31;7:11630. doi: 10.1038/ncomms11630.

Abstract

Ferroelectric domain walls are of great interest as elementary building blocks for future electronic devices due to their intrinsic few-nanometre width, multifunctional properties and field-controlled topology. To realize the electronic functions, domain walls are required to be electrically conducting and addressable non-destructively. However, these properties have been elusive because conducting walls have to be electrically charged, which makes them unstable and uncommon in ferroelectric materials. Here we reveal that spontaneous and recorded domain walls in thin films of lead zirconate and bismuth ferrite exhibit large conductance at microwave frequencies despite being insulating at d.c. We explain this effect by morphological roughening of the walls and local charges induced by disorder with the overall charge neutrality. a.c. conduction is immune to large contact resistance enabling completely non-destructive walls read-out. This demonstrates a technological potential for harnessing a.c. conduction for oxide electronics and other materials with poor d.c. conduction, particularly at the nanoscale.

摘要

铁电畴壁因其固有纳米级宽度、多功能特性和场控拓扑结构,作为未来电子设备的基本构建块而备受关注。为了实现电子功能,需要使畴壁具有导电性和可非破坏性寻址。然而,由于具有导电性的畴壁必须带电,这使得它们在铁电材料中不稳定且不常见,因此这些特性一直难以实现。在这里,我们揭示了在锆酸铅和铋铁氧体薄膜中的自发和记录畴壁尽管在直流时是绝缘的,但在微波频率下表现出大的电导。我们通过壁的形态粗糙化和由无序引起的局部电荷来解释这种效应,尽管整体电荷是中性的。交流传导不受大接触电阻的影响,从而能够实现完全非破坏性的畴壁读取。这展示了利用交流传导来实现氧化物电子学和其他直流传导不良的材料的技术潜力,特别是在纳米尺度上。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/04c1/4895023/6543e32a2f8a/ncomms11630-f1.jpg

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