Laboratoire de Photonique et de Nanostructures (LPN), CNRS, Université Paris-Saclay, Route de Nozay , F-91460 Marcoussis, France.
Institut d'Electronique Fondamentale, UMR 8622 CNRS, University Paris Sud, University Paris-Saclay , 91405 Orsay cedex, France.
Nano Lett. 2016 Aug 10;16(8):4895-902. doi: 10.1021/acs.nanolett.6b01453. Epub 2016 Jul 26.
Epitaxial growth of GaN nanowires on graphene is demonstrated using molecular beam epitaxy without any catalyst or intermediate layer. Growth is highly selective with respect to silica on which the graphene flakes, grown by chemical vapor deposition, are transferred. The nanowires grow vertically along their c-axis and we observe a unique epitaxial relationship with the ⟨21̅1̅0⟩ directions of the wurtzite GaN lattice parallel to the directions of the carbon zigzag chains. Remarkably, the nanowire density and height decrease with increasing number of graphene layers underneath. We attribute this effect to strain and we propose a model for the nanowire density variation. The GaN nanowires are defect-free and they present good optical properties. This demonstrates that graphene layers transferred on amorphous carrier substrates is a promising alternative to bulk crystalline substrates for the epitaxial growth of high quality GaN nanostructures.
在没有任何催化剂或中间层的情况下,使用分子束外延法在石墨烯上外延生长 GaN 纳米线。生长对转移到其上的石墨烯薄片的二氧化硅具有高度选择性,这些石墨烯薄片是通过化学气相沉积生长的。纳米线沿着它们的 c 轴垂直生长,我们观察到与六方氮化镓晶格的 ⟨21̅1̅0⟩方向具有独特的外延关系,这些方向与碳锯齿链的方向平行。值得注意的是,随着下方石墨烯层数量的增加,纳米线的密度和高度减小。我们将这种效应归因于应变,并提出了一种纳米线密度变化的模型。GaN 纳米线无缺陷,并具有良好的光学性能。这表明,转移到非晶载体衬底上的石墨烯层是在高质量 GaN 纳米结构的外延生长中替代块状晶体衬底的有前途的方法。