Cheung Chi-Ho, Fuh Huei-Ru, Hsu Ming-Chien, Lin Yeu-Chung, Chang Ching-Ray
Graduate Institute of Applied Physics, National Taiwan University, Taipei, 10617, Taiwan.
Department of Physics, National Taiwan University, Taipei, 10617, Taiwan.
Nanoscale Res Lett. 2016 Dec;11(1):459. doi: 10.1186/s11671-016-1666-4. Epub 2016 Oct 18.
Recently, searching large-bulk band gap topological insulator (TI) is under intensive study. Through k·P theory and first-principles calculations analysis on antimonene, we find that α-phase antimonene can be tuned to a 2D TI under an in-plane anisotropic strain and the magnitude of direct bulk band gap (SOC gap) depends on the strength of spin-orbit coupling (SOC) which is strain-dependent. As the band inversion of this TI accompanies with an indirect band gap, the TI bulk band gap is the indirect band gap, not the SOC gap. SOC gap can be enhanced by increasing strain, whereas the indirect band gap can be closed by increasing strain, such that large bulk band gap are forbidden. With the k·P theory analysis on antimonene, we know how to avoid such an indirect band gap. In case of indirect band gap avoided, the SOC gap could become the bulk band gap of a TI which can be enhanced by strain. Thus our theoretical analysis can help searching large bulk band gap TI.
最近,寻找大带隙拓扑绝缘体(TI)的研究正在密集进行。通过对锑烯的k·P理论和第一性原理计算分析,我们发现α相锑烯在面内各向异性应变下可被调制成二维TI,其直接体带隙(SOC带隙)的大小取决于自旋轨道耦合(SOC)的强度,而SOC强度与应变有关。由于该TI的能带反转伴随着间接带隙,因此TI的体带隙是间接带隙,而非SOC带隙。通过增加应变可以增强SOC带隙,而增加应变会使间接带隙闭合,从而无法获得大的体带隙。通过对锑烯的k·P理论分析,我们知道如何避免这种间接带隙。在避免间接带隙的情况下,SOC带隙可以成为TI的体带隙,并且可以通过应变来增强。因此,我们的理论分析有助于寻找大带隙TI。