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用碳对拓扑绝缘体进行同时磁和电荷掺杂。

Simultaneous magnetic and charge doping of topological insulators with carbon.

机构信息

Department of Physics, 2 Science Drive 3, National University of Singapore, Singapore 117542, Singapore.

出版信息

Phys Rev Lett. 2013 Dec 6;111(23):236803. doi: 10.1103/PhysRevLett.111.236803. Epub 2013 Dec 5.

Abstract

A two-step doping process, magnetic followed by charge or vice versa, is required to produce massive topological surface states (TSS) in topological insulators for many physics and device applications. Here, we demonstrate simultaneous magnetic and hole doping achieved with a single dopant, carbon, in Bi2Se3 by first-principles calculations. Carbon substitution for Se (C(Se)) results in an opening of a sizable surface Dirac gap (up to 82 meV), while the Fermi level remains inside the bulk gap and close to the Dirac point at moderate doping concentrations. The strong localization of 2p states of C(Se) favors spontaneous spin polarization via a p-p interaction and formation of ordered magnetic moments mediated by surface states. Meanwhile, holes are introduced into the system by C(Se). This dual function of carbon doping suggests a simple way to realize insulating massive TSS.

摘要

两步掺杂过程,即先进行磁场掺杂,再进行电荷掺杂,或者反之,是在拓扑绝缘体中产生大量拓扑表面态(TSS)以用于许多物理和器件应用所必需的。在这里,我们通过第一性原理计算证明了通过单个掺杂剂——碳,在 Bi2Se3 中同时实现磁场掺杂和空穴掺杂。硒取代碳(C(Se))导致表面狄拉克带隙显著打开(最大可达 82 meV),而费米能级仍处于体隙内且在中等掺杂浓度下接近狄拉克点。C(Se)的 2p 态强烈局域化有利于通过 p-p 相互作用和通过表面态介导的有序磁矩形成来自发产生自旋极化。同时,通过 C(Se)向体系中引入空穴。碳掺杂的这种双重功能表明了一种实现绝缘性大量 TSS 的简单方法。

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