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通过静电门控来调节超薄 WTe 片的磁电阻。

Tuning the magnetoresistance of ultrathin WTe sheets by electrostatic gating.

机构信息

Max-Planck-Institute for Solid State Research, Heisenbergstrasse 1, D-70569 Stuttgart, Germany.

出版信息

Nanoscale. 2016 Nov 10;8(44):18703-18709. doi: 10.1039/c6nr06327f.

Abstract

The semimetallic, two-dimensional layered transition metal dichalcogenide WTe has raised considerable interest due to its huge, non-saturating magnetoresistance. While for the origin of this effect, a close-to-ideal balance of electrons and holes has been put forward, the carrier concentration dependence of the magnetoresistance remains to be clarified. Here, we present a detailed study of the magnetotransport behaviour of ultrathin, mechanically exfoliated WTe sheets as a function of electrostatic back gating. The carrier concentration and mobility, determined using the two band model and analysis of the Shubnikov-de Haas oscillations, indicate enhanced surface scattering for the thinnest sheets. By the back gate action, the magnetoresistance could be tuned by up to ∼100% for a ∼13 nm-thick WTe sheet.

摘要

由于具有巨大的、非饱和的磁电阻,半金属二维层状过渡金属二卤族化合物 WTe 引起了相当大的兴趣。虽然对于这种效应的起源,提出了电子和空穴的近乎理想的平衡,但磁电阻的载流子浓度依赖性仍有待澄清。在这里,我们详细研究了作为静电背栅函数的超薄机械剥离 WTe 薄片的磁输运行为。使用双带模型和舒布尼科夫-德哈斯振荡的分析确定的载流子浓度和迁移率表明,最薄的薄片的表面散射增强。通过背栅作用,对于约 13nm 厚的 WTe 薄片,磁电阻可以调节高达约 100%。

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