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Pb(ZrTi)O/Nb:SrTiO 异质结构的电阻开关和调制。

Resistive Switching and Modulation of Pb(ZrTi)O/Nb:SrTiO Heterostructures.

机构信息

Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences , Shenyang 110016, China.

出版信息

ACS Appl Mater Interfaces. 2016 Dec 7;8(48):32948-32955. doi: 10.1021/acsami.6b10992. Epub 2016 Nov 18.

Abstract

In this work, epitaxial Pb(ZrTi)O (PZT) thin films with different thicknesses were deposited on Nb-doped SrTiO (NSTO) single-crystal substrates by chemical solution deposition (CSD), and their ferroelectric resistive switching behaviors were investigated. The results showed that the maximum ON/OFF ratio up to 850 could be obtained in the PZT/NSTO heterostructure with the 150 nm thick PZT film. On the basis of the Schottky-Simmons model and the modified semiconductor theory, we also evaluated the interfacial built-in field and the depletion layer at the PZT/NSTO interface, which can be modulated strongly by the ferroelectric polarization, but are independent of the thickness of the PZT thin films. It is clear that the ferroelectric resistive switching is related to the ferroelectric polarization and modulated by the thickness of ferroelectric films. Therefore, there is an optimal thickness of the PZT film for the maximum ON/OFF ratio due to the ferroelectricity and conductivity mutually restricting. It can be expected that by adjusting the ferroelectricity and conductivity of the ferroelectric thin film and its thickness, the maximum switching ratio can be further improved.

摘要

在这项工作中,通过化学溶液沉积(CSD)在 Nb 掺杂 SrTiO(NSTO)单晶衬底上沉积了不同厚度的外延 Pb(ZrTi)O(PZT)薄膜,并研究了它们的铁电电阻开关特性。结果表明,在厚度为 150nm 的 PZT 薄膜中,PZT/NSTO 异质结构可以获得高达 850 的最大 ON/OFF 比。基于肖特基-西蒙斯模型和修正半导体理论,我们还评估了 PZT/NSTO 界面处的界面内置电场和耗尽层,这些可以通过铁电极化强烈调制,但与 PZT 薄膜的厚度无关。显然,铁电电阻开关与铁电极化有关,并受到铁电薄膜厚度的调制。因此,由于铁电性和导电性相互制约,对于最大 ON/OFF 比存在一个最佳的 PZT 薄膜厚度。可以预期,通过调整铁电薄膜的铁电性和导电性及其厚度,可以进一步提高最大开关比。

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