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254纳米紫外线诱导的(6-4)光产物的修复:单克隆抗体识别及着色性干皮病互补组A、D和变异型中的差异缺陷

Repair of 254 nm ultraviolet-induced (6-4) photoproducts: monoclonal antibody recognition and differential defects in xeroderma pigmentosum complementation groups A, D, and variant.

作者信息

Hiramoto T, Matsunaga T, Ichihashi M, Nikaido O, Fujiwara Y, Mishima Y

机构信息

Department of Dermatology, Kobe University, School of Medicine, Japan.

出版信息

J Invest Dermatol. 1989 Nov;93(5):703-6. doi: 10.1111/1523-1747.ep12319907.

Abstract

Repair kinetics of ultraviolet (UV) light-induced (6-4) photoproducts in xeroderma pigmentosum complementation group A, D, and variant cells were studied by the enzyme-linked immunosorbent assay (ELISA) using a specific monoclonal antibody raised against (6-4) photoproducts, together with unscheduled DNA synthesis (UDS) and loss of T4 endonuclease V-susceptible sites (ESS). Group AXP35KO cells completely failed to repair both ESS (cyclobutane pyrimidine dimers) and antibody-recognizing (6-4) photoproducts until tested 24 h after irradiation, and had 2% early-time UDS. Group DXP43KO cells showed about 10% removal of both (6-4) photoproducts and ESS in 24 h, despite showing a residually higher level of 40% early-time and cumulative UDS. Thus, the results substantiated the extreme UV hypersensitivity of XP group A and D cells. However, XP52KO variant cells exhibited the normal level of UDS and ESS loss, but a slightly reduced repair of antibody-recognizing (6-4) photoproducts at 6 and 12 h after irradiation, which may account for a small UV hypersensitivity of the XP variant cells.

摘要

通过酶联免疫吸附测定(ELISA),使用针对(6-4)光产物产生的特异性单克隆抗体,结合非预定DNA合成(UDS)和T4内切核酸酶V敏感位点(ESS)的丧失,研究了着色性干皮病互补组A、D和变异细胞中紫外线(UV)诱导的(6-4)光产物的修复动力学。AXP35KO组细胞在照射后24小时进行检测之前,完全无法修复ESS(环丁烷嘧啶二聚体)和抗体识别的(6-4)光产物,且早期UDS为2%。DXP43KO组细胞在24小时内显示约10%的(6-4)光产物和ESS被去除,尽管早期和累积UDS残留水平较高,为40%。因此,结果证实了XP组A和D细胞对紫外线的极度敏感性。然而,XP52KO变异细胞表现出正常水平的UDS和ESS丧失,但在照射后6小时和12小时,抗体识别的(6-4)光产物的修复略有减少,这可能是XP变异细胞对紫外线有轻微敏感性的原因。

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