A new method for simultaneous measurement of Seebeck coefficient and resistivity.

A new method has been proposed and verified to measure the Seebeck coefficient and electrical resistivity of a sample in the paper. Different from the conventional method for Seebeck coefficient and resistivity measurement, the new method adopts a four-point configuration to measure both the Seebeck coefficient and resistivity. It can well identify the inhomogeneity of the sample by simply comparing the four Seebeck coefficients of different probe combinations, and it is more accurate and appropriate to take the average value of the four Seebeck coefficients as the measured result of the Seebeck coefficient of the sample than that measured by the two-point method. Furthermore, the four-point configuration makes it also very convenient to measure the resistivity by using the Van der Pauw method. The validity of this method has been verified with both the constantan alloy and p-type BiTe semiconductor samples, and the measurement results are in good agreement with those obtained by commercial available equipment.