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激光烧蚀辅助溶液加工制备有机薄膜晶体管阵列

Solution-Processed Organic Thin-Film Transistor Arrays with the Assistance of Laser Ablation.

机构信息

Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University , Fuzhou 350002, China.

College of Information Science and Engineering, Fujian University of Technology , Fuzhou 350108, China.

出版信息

ACS Appl Mater Interfaces. 2017 Feb 1;9(4):3849-3856. doi: 10.1021/acsami.6b14813. Epub 2017 Jan 20.

Abstract

A key step toward commercialization of organic thin-film transistors (OTFTs) is to manufacture large-area OTFT arrays with desired uniform device performance. In this work, for the first time, solution-processed OTFT arrays were fabricated with the assistance of laser ablation. The source-drain electrodes and the whole devices were patterned by precise control of laser intensity and process path. Compared with traditional methods, this approach significantly simplifies the fabrication process of OTFT arrays with high quality and high yield. A careful selection of laser processing parameters is key to obtaining high quality and high performance OTFT arrays. The grazing incidence X-ray diffraction experiments and device performance tests ensured the selection of proper laser ablation intensity. Eventually, the OTFT arrays on silicon wafer and ITO glass exhibited uniform electrical characteristics with the mean mobility of 0.16 and 0.10 cm V s, respectively. These results demonstrated that the laser ablation process provides a promising tool to simplify the fabrication of solution-processed OTFT arrays with low cost and high yield, which has great potential in upscaling of high performance OTFT arrays for display and circuits.

摘要

将有机薄膜晶体管(OTFT)商业化的关键步骤之一是制造具有所需均匀器件性能的大面积 OTFT 阵列。在这项工作中,首次通过激光烧蚀辅助来制造溶液处理的 OTFT 阵列。通过精确控制激光强度和处理路径,可以对源极-漏极电极和整个器件进行图案化。与传统方法相比,这种方法显著简化了高质量和高产量的 OTFT 阵列的制造工艺。仔细选择激光处理参数是获得高质量和高性能 OTFT 阵列的关键。掠入射 X 射线衍射实验和器件性能测试确保了适当的激光烧蚀强度的选择。最终,硅晶片和 ITO 玻璃上的 OTFT 阵列表现出均匀的电特性,平均迁移率分别为 0.16 和 0.10 cm V s。这些结果表明,激光烧蚀工艺为简化低成本、高产量的溶液处理 OTFT 阵列的制造提供了一种有前途的工具,这对于用于显示和电路的高性能 OTFT 阵列的扩展具有很大的潜力。

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