Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France.
Institut de Physique de Rennes, UMR 6251 CNRS, Département Matériaux Nanosciences, Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France.
Nanoscale. 2017 Feb 2;9(5):1799-1804. doi: 10.1039/c6nr08408g.
The immersion of oxide-free Si surfaces in MoS aqueous solutions induces their spontaneous decoration with isolated MoO nanoparticles (NPs). The process is versatile and was used on planar Si (100) as well as on antireflective Si (111) micro-pyramid (SimPy) arrays. The NP decoration does not affect the optical properties of the surface in the visible range and improves the performance of the hydrogen evolution reaction (HER) under simulated sunlight. The simplicity and the scalability of the technique make it highly promising for the fabrication of catalytically active photoelectrodes. More specifically, the MoO-decorated SimPy produced H at a rate of 11 μmol cm min with a faradaic efficiency higher than 90% at -0.35 V vs. RHE. Furthermore, this process can be of great interest for other applications in high-performance electronic devices.
氧化物自由 Si 表面浸入 MoS 水溶液中会诱导其自发装饰孤立的 MoO 纳米颗粒 (NPs)。该过程具有通用性，已应用于平面 Si (100) 以及抗反射 Si (111) 微金字塔 (SimPy) 阵列。纳米颗粒装饰不会影响表面在可见光范围内的光学性质，并提高模拟阳光下析氢反应 (HER) 的性能。该技术的简单性和可扩展性使其非常有前途用于制备催化活性光电电极。更具体地说，MoO 修饰的 SimPy 在 -0.35 V 相对于 RHE 时以 11 μmol cm min 的速率产生 H，法拉第效率高于 90%。此外，该过程对于高性能电子设备中的其他应用也具有重要意义。
