通过物理气相薄膜沉积技术制备的五氧化二钽涂层的折射率重复性研究。

Investigation of the refractive index repeatability for tantalum pentoxide coatings, prepared by physical vapor film deposition techniques.

作者信息

Stenzel O, Wilbrandt S, Wolf J, Schürmann M, Kaiser N, Ristau D, Ehlers H, Carstens F, Schippel S, Mechold L, Rauhut R, Kennedy M, Bischoff M, Nowitzki T, Zöller A, Hagedorn H, Reus H, Hegemann T, Starke K, Harhausen J, Foest R, Schumacher J

出版信息

Appl Opt. 2017 Feb 1;56(4):C193-C200. doi: 10.1364/AO.56.00C193.

DOI:10.1364/AO.56.00C193

PMID:28158073

Abstract

Random effects in the repeatability of refractive index and absorption edge position of tantalum pentoxide layers prepared by plasma-ion-assisted electron-beam evaporation, ion beam sputtering, and magnetron sputtering are investigated and quantified. Standard deviations in refractive index between 410 and 410 have been obtained. Here, lowest standard deviations in refractive index close to our detection threshold could be achieved by both ion beam sputtering and plasma-ion-assisted deposition. In relation to the corresponding mean values, the standard deviations in band-edge position and refractive index are of similar order.

摘要

研究并量化了通过等离子体离子辅助电子束蒸发、离子束溅射和磁控溅射制备的五氧化二钽层的折射率和吸收边位置重复性中的随机效应。已获得折射率在4×10⁻⁴至4×10⁻³之间的标准偏差。在此，通过离子束溅射和等离子体离子辅助沉积均可实现接近我们检测阈值的最低折射率标准偏差。相对于相应的平均值，带边位置和折射率的标准偏差具有相似的量级。