溅射过程中纳米结构金属玻璃薄膜的形成。
Formation of nanostructured metallic glass thin films upon sputtering.
作者信息
Ketov Sergey V, Joksimovic Rastko, Xie Guoqiang, Trifonov Artem, Kurihara Kazue, Louzguine-Luzgin Dmitri V
机构信息
WPI Advanced Institute for Materials Research, Tohoku University, Aoba-Ku, Sendai 980-8577, Japan.
Institute for Materials Research, Tohoku University, Aoba-Ku, Sendai 980-8577, Japan.
出版信息
Heliyon. 2017 Jan 9;3(1):e00228. doi: 10.1016/j.heliyon.2016.e00228. eCollection 2017 Jan.
Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films with a smooth surface and nanoglassy structure were deposited on silica float glass and Si substrates. The phase composition of the target appeared to have a significant influence on the chemical composition of the deposited amorphous thin film. The differences in charge transport and nanomechanical properties between the smooth and nanoglassy Ni-Nb film were also determined.
在本工作中，研究了通过射频（RF）磁控溅射获得的多组分金属玻璃薄膜的形貌演变。区分了两种金属玻璃溅射模式：光滑薄膜模式和团簇薄膜模式。确定了对溅射模式影响最大的溅射参数。结果，在二氧化硅浮法玻璃和硅衬底上沉积了具有光滑表面和纳米玻璃结构的非晶态Ni-Nb薄膜。靶材的相组成似乎对沉积的非晶态薄膜的化学成分有显著影响。还确定了光滑和纳米玻璃态Ni-Nb薄膜在电荷传输和纳米力学性能方面的差异。
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