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实验证据表明,通过在(AlN)/(GaN)超晶格中进行 Mg δ 掺杂,可以降低高 Al 含量 AlGaN 合金中 Mg 的激活能。

Experimental evidences for reducing Mg activation energy in high Al-content AlGaN alloy by Mg δ doping in (AlN)/(GaN) superlattice.

机构信息

Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, School of Physics and Technology, Wuhan University, Wuhan 430072, China.

出版信息

Sci Rep. 2017 Mar 14;7:44223. doi: 10.1038/srep44223.

Abstract

P-type doping in high Al-content AlGaN alloys is a main challenge for realizing AlGaN-based deep ultraviolet optoelectronics devices. According to the first-principles calculations, Mg activation energy may be reduced so that a high hole concentration can be obtained by introducing nanoscale (AlN)/(GaN) superlattice (SL) in AlGaN disorder alloy. In this work, experimental evidences were achieved by analyzing Mg doped high Al-content AlGaN alloys and Mg doped AlGaN SLs as well as Mg δ doped AlGaN SLs. Mg acceptor activation energy was significantly reduced from 0.378 to 0.331 eV by using Mg δ doping in SLs instead of traditional doping in alloys. This new process was confirmed to be able to realize high p-type doping in high Al-content AlGaN.

摘要

在高铝含量 AlGaN 合金中实现 P 型掺杂是实现基于 AlGaN 的深紫外光电子器件的主要挑战。根据第一性原理计算,通过在 AlGaN 无序合金中引入纳米级(AlN)/(GaN)超晶格(SL),可以降低 Mg 的激活能,从而获得高浓度空穴。在这项工作中,通过分析掺镁的高铝含量 AlGaN 合金以及掺镁的 AlGaN SL 和 Mg δ 掺杂的 AlGaN SL,得到了实验证据。通过在 SL 中而不是在合金中进行 Mg δ 掺杂,Mg 受主激活能从 0.378 eV 显著降低到 0.331 eV。这一新工艺被证实能够在高铝含量 AlGaN 中实现高 P 型掺杂。

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