Department of Chemistry, Stanford University, Stanford, California 94305; email:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305; email:
Annu Rev Chem Biomol Eng. 2017 Jun 7;8:41-62. doi: 10.1146/annurev-chembioeng-060816-101547. Epub 2017 Feb 27.
A new generation of catalysts is needed to meet society's energy and resource requirements. Current catalyst synthesis does not fully achieve optimum control of composition, size, and structure. Atomic layer deposition (ALD) is an emerging technique that allows for synthesis of highly controlled catalysts in the form of films, nanoparticles, and single sites. The addition of ALD coatings can also be used to introduce promoters and improve the stability of traditional catalysts. Evolving research shows promise for applying ALD to understand catalytically active sites and create next-generation catalysts using advanced 3D nanostructures.
需要新一代的催化剂来满足社会的能源和资源需求。目前的催化剂合成不能完全实现对组成、大小和结构的最佳控制。原子层沉积（ALD）是一种新兴技术，可用于以薄膜、纳米粒子和单原子的形式合成高度可控的催化剂。ALD 涂层的添加也可用于引入促进剂并提高传统催化剂的稳定性。不断发展的研究表明，ALD 有望用于理解催化活性位，并利用先进的 3D 纳米结构来创造下一代催化剂。
