Li Huijie, Zhao Guijuan, Wang Lianshan, Chen Zhen, Yang Shaoyan
Key Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, China.
University of Chinese Academy of Sciences, Beijing 100049, China.
Nanomaterials (Basel). 2016 Oct 29;6(11):195. doi: 10.3390/nano6110195.
Growth of semiconductor nanowires on cheap metal substrates could pave the way to the large-scale manufacture of low-cost nanowire-based devices. In this work, we demonstrated that high density InN nanowires can be directly grown on brass substrates by metal-organic chemical vapor deposition. It was found that Zn from the brass substrates is the key factor in the formation of nanowires by restricting the lateral growth of InN. The nanowire morphology is highly dependent on the growth temperature. While at a lower growth temperature, the nanowires and the In droplets have large diameters. At the elevated growth temperature, the lateral sizes of the nanowires and the In droplets are much smaller. Moreover, the nanowire diameter can be controlled in situ by varying the temperature in the growth process. This method is very instructive to the diameter-controlled growth of nanowires of other materials.
在廉价金属衬底上生长半导体纳米线可为大规模制造低成本的基于纳米线的器件铺平道路。在这项工作中,我们证明了通过金属有机化学气相沉积法可以在黄铜衬底上直接生长高密度的氮化铟纳米线。研究发现,黄铜衬底中的锌是通过限制氮化铟的横向生长来形成纳米线的关键因素。纳米线的形态高度依赖于生长温度。在较低的生长温度下,纳米线和铟滴具有较大的直径。在升高的生长温度下,纳米线和铟滴的横向尺寸要小得多。此外,通过在生长过程中改变温度可以原位控制纳米线的直径。该方法对其他材料纳米线的直径控制生长具有很大的指导意义