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Active pixel imagers incorporating pixel-level amplifiers based on polycrystalline-silicon thin-film transistors.基于多晶硅薄膜晶体管的包含像素级放大器的有源像素成像器。
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An investigation of signal performance enhancements achieved through innovative pixel design across several generations of indirect detection, active matrix, flat-panel arrays.通过跨几代间接检测、有源矩阵、平板阵列的创新像素设计实现的信号性能增强研究。
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基于多晶硅薄膜晶体管的有源像素成像阵列噪声性能的理论研究。

Theoretical investigation of the noise performance of active pixel imaging arrays based on polycrystalline silicon thin film transistors.

机构信息

Department of Radiation Oncology, University of Michigan, Ann Arbor, MI, 48109, USA.

出版信息

Med Phys. 2017 Jul;44(7):3491-3503. doi: 10.1002/mp.12257. Epub 2017 May 22.

DOI:10.1002/mp.12257
PMID:28376261
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5508538/
Abstract

PURPOSE

Active matrix flat-panel imagers, which typically incorporate a pixelated array with one a-Si:H thin-film transistor (TFT) per pixel, have become ubiquitous by virtue of many advantages, including large monolithic construction, radiation tolerance, and high DQE. However, at low exposures such as those encountered in fluoroscopy, digital breast tomosynthesis and breast computed tomography, DQE is degraded due to the modest average signal generated per interacting x-ray relative to electronic additive noise levels of ~1000 e, or greater. A promising strategy for overcoming this limitation is to introduce an amplifier into each pixel, referred to as the active pixel (AP) concept. Such circuits provide in-pixel amplification prior to readout as well as facilitate correlated multiple sampling, enhancing signal-to-noise and restoring DQE at low exposures. In this study, a methodology for theoretically investigating the signal and noise performance of imaging array designs is introduced and applied to the case of AP circuits based on low-temperature polycrystalline silicon (poly-Si), a semiconductor suited to manufacture of large area, radiation tolerant arrays.

METHODS

Computer simulations employing an analog circuit simulator and performed in the temporal domain were used to investigate signal characteristics and major sources of electronic additive noise for various pixel amplifier designs. The noise sources include photodiode shot noise and resistor thermal noise, as well as TFT thermal and flicker noise. TFT signal behavior and flicker noise were parameterized from fits to measurements performed on individual poly-Si test TFTs. The performance of three single-stage and three two-stage pixel amplifier designs were investigated under conditions relevant to fluoroscopy. The study assumes a 20 × 20 cm , 150 μm pitch array operated at 30 fps and coupled to a CsI:Tl x-ray converter. Noise simulations were performed as a function of operating conditions, including sampling mode, of the designs. The total electronic additive noise included noise contributions from each circuit component.

RESULTS

The total noise results were found to exhibit a strong dependence on circuit design and operating conditions, with TFT flicker noise generally found to be the dominant noise contributor. For the single-stage designs, significantly increasing the size of the source-follower TFT substantially reduced flicker noise - with the lowest total noise found to be ~574 e [rms]. For the two-stage designs, in addition to tuning TFT sizes and introducing a low-pass filter, replacing a p-type TFT with a resistor (under the assumption in the study that resistors make no flicker noise contribution) resulted in significant noise reduction - with the lowest total noise found to be ~336 e [rms].

CONCLUSIONS

A methodology based on circuit simulations which facilitates comprehensive explorations of signal and noise characteristics has been developed and applied to the case of poly-Si AP arrays. The encouraging results suggest that the electronic additive noise of such devices can be substantially reduced through judicious circuit design, signal amplification, and multiple sampling. This methodology could be extended to explore the noise performance of arrays employing other pixel circuitry such as that for photon counting as well as other semiconductor materials such as a-Si:H and a-IGZO.

摘要

目的

有源矩阵平板成像仪通常采用像素化阵列,每个像素都有一个非晶硅(a-Si:H)薄膜晶体管(TFT),由于具有许多优点,包括大型单片结构、辐射耐受性和高量子检测效率(DQE),因此已经无处不在。然而,在低曝光条件下,例如透视、数字乳腺断层合成和乳腺计算机断层扫描中遇到的曝光条件,DQE 会因每个相互作用的 X 射线产生的平均信号相对于约 1000e 或更高的电子附加噪声水平而降低。克服这一限制的一种有前途的策略是在每个像素中引入一个放大器,称为有源像素(AP)概念。这种电路在读取之前提供像素内放大,并促进相关的多次采样,从而提高低曝光条件下的信号噪声比并恢复 DQE。在这项研究中,介绍了一种用于理论研究成像阵列设计的信号和噪声性能的方法,并将其应用于基于低温多晶硅(poly-Si)的 AP 电路的情况,poly-Si 适用于制造大面积、辐射耐受阵列。

方法

采用模拟电路模拟器在时域进行计算机模拟,用于研究各种像素放大器设计的信号特性和主要电子附加噪声源。噪声源包括光电二极管散粒噪声和电阻热噪声,以及 TFT 热噪声和闪烁噪声。TFT 信号行为和闪烁噪声通过对单个 poly-Si 测试 TFT 进行拟合来参数化。在与透视相关的条件下,研究了三种单级和三种两级像素放大器设计的性能。该研究假设一个 20×20cm、150μm 间距的阵列以 30fps 运行,并与 CsI:Tl X 射线转换器耦合。噪声模拟作为设计的工作模式等操作条件的函数进行。总电子附加噪声包括每个电路元件的噪声贡献。

结果

发现总噪声结果强烈依赖于电路设计和工作条件,TFT 闪烁噪声通常是主要的噪声贡献者。对于单级设计,显著增加源跟随器 TFT 的尺寸可大大降低闪烁噪声 - 发现最低的总噪声约为 574e[rms]。对于两级设计,除了调整 TFT 尺寸并引入低通滤波器外,用电阻代替 p 型 TFT(研究中假设电阻不产生闪烁噪声贡献)也会导致噪声显著降低 - 发现最低的总噪声约为 336e[rms]。

结论

已经开发并应用了一种基于电路模拟的方法,该方法有助于全面研究信号和噪声特性,并应用于 poly-Si AP 阵列的情况。令人鼓舞的结果表明,通过明智的电路设计、信号放大和多次采样,可以大大降低此类器件的电子附加噪声。该方法可以扩展到研究采用其他像素电路的阵列的噪声性能,例如光子计数以及其他半导体材料,如 a-Si:H 和 a-IGZO。