Department of Materials Science and Engineering, Myongji University, Gyeonggi-do 17058, Republic of Korea.
Nanotechnology. 2017 Jun 2;28(22):225201. doi: 10.1088/1361-6528/aa6dac. Epub 2017 May 10.
A synaptic transistor emulating the biological synaptic motion is demonstrated using the memcapacitance characteristics in a Pt/HfOx/n-indium-gallium-zinc-oxide (IGZO) memcapacitor. First, the metal-oxide-semiconductor (MOS) capacitor with Pt/HfOx/n-IGZO structure exhibits analog, polarity-dependent, and reversible memcapacitance in capacitance-voltage (C-V), capacitance-time (C-t), and voltage-pulse measurements. When a positive voltage is applied repeatedly to the Pt electrode, the accumulation capacitance increases gradually and sequentially. The depletion capacitance also increases consequently. The capacitances are restored by repeatedly applying a negative voltage, confirming the reversible memcapacitance. The analog and reversible memcapacitance emulates the potentiation and depression synaptic motions. The synaptic thin-film transistor (TFT) with this memcapacitor also shows the synaptic motion with gradually increasing drain current by repeatedly applying the positive gate and drain voltages and reversibly decreasing one by applying the negative voltages, representing synaptic weight modulation. The reversible and analog conductance change in the transistor at both the voltage sweep and pulse operations is obtained through the memcapacitance and threshold voltage shift at the same time. These results demonstrate the synaptic transistor operations with a MOS memcapacitor gate stack consisting of Pt/HfOx/n-IGZO.
使用 Pt/HfOx/n-铟镓锌氧化物(IGZO)忆阻器中的忆阻电容特性,展示了一种模拟生物突触运动的突触晶体管。首先,Pt/HfOx/n-IGZO 结构的金属-氧化物-半导体(MOS)电容器在电容-电压(C-V)、电容-时间(C-t)和电压脉冲测量中表现出模拟、极性相关和可重复的忆阻电容。当在 Pt 电极上重复施加正电压时,积累电容逐渐且连续地增加。耗尽电容也随之增加。通过重复施加负电压,可以恢复电容,证实了可重复的忆阻电容。模拟和可重复的忆阻电容模拟了增强和抑制突触运动。具有此忆阻器的突触薄膜晶体管(TFT)也通过重复施加正栅极和漏极电压,使漏极电流逐渐增加,以及通过施加负电压,使电流可反向降低,表现出突触权重调节的特性。通过忆阻器和阈值电压的同时漂移,在电压扫描和脉冲操作中都可以获得晶体管的可重复和模拟电导变化。这些结果证明了由 Pt/HfOx/n-IGZO 组成的 MOS 忆阻器栅堆叠的突触晶体管的工作性能。