The School of Chemistry, The University of Manchester, Oxford Road, Manchester, M13 9PL, UK.
The Kavli Nanoscience Institute, California Institute of Technology, 1200 East California Boulevard, 107-81, Pasadena, CA, 91125, USA.
Angew Chem Int Ed Engl. 2017 Jun 6;56(24):6749-6752. doi: 10.1002/anie.201700224. Epub 2017 May 15.
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.
一种新的基于超分子组装的电子束光刻抗蚀材料已经被开发出来。初步研究表明，通过这种超分子方法，可以写入具有超高分辨率的结构，并且在涉及等离子体的蚀刻条件下显示出前所未有的选择性。
