Zargouni Yafa, Deheryan Stella, Radisic Alex, Alouani Khaled, Vereecken Philippe M
KACST-Intel Consortium Centre of Excellence in Nano-Manufacturing and Applications (CENA), Riyadh 11442, Saudi Arabia.
Imec, Kapeldreef 75, B-3001 Leuven, Belgium.
Nanomaterials (Basel). 2017 May 27;7(6):126. doi: 10.3390/nano7060126.
In this work, we present the electrochemical deposition of manganese dioxide (MnO₂) thin films on carbon-coated TiN/Si micro-pillars. The carbon buffer layer, grown by plasma enhanced chemical vapor deposition (PECVD), is used as a protective coating for the underlying TiN current collector from oxidation, during the film deposition, while improving the electrical conductivity of the stack. A conformal electrolytic MnO₂ (EMD) coating is successfully achieved on high aspect ratio C/TiN/Si pillar arrays by tailoring the deposition process. Lithiation/Delithiation cycling tests have been performed. Reversible insertion and extraction of Li⁺ through EMD structure are observed. The fabricated stack is thus considered as a good candidate not only for 3D micorbatteries but also for other energy storage applications.
在本工作中，我们展示了在碳包覆的TiN/Si微柱上电化学沉积二氧化锰（MnO₂）薄膜的过程。通过等离子体增强化学气相沉积（PECVD）生长的碳缓冲层，在薄膜沉积过程中用作底层TiN集流体的抗氧化保护涂层，同时提高堆叠结构的电导率。通过调整沉积工艺，在高纵横比的C/TiN/Si柱阵列上成功实现了保形电解MnO₂（EMD）涂层。进行了锂化/脱锂循环测试。观察到Li⁺通过EMD结构的可逆嵌入和脱出。因此，所制备的堆叠结构不仅被认为是三维微型电池的良好候选材料，也是其他能量存储应用的良好候选材料。
