钌表面自组装单分子层的特性研究。

Characterization of Self-Assembled Monolayers on a Ruthenium Surface.

机构信息

Industrial focus group XUV Optics, MESA+ Institute for Nanotechnology, and ‡MNF group, MESA+ Institute for Nanotechnology, University of Twente , Enschede, The Netherlands.

出版信息

Langmuir. 2017 Jun 27;33(25):6419-6426. doi: 10.1021/acs.langmuir.7b01068. Epub 2017 Jun 12.

DOI:10.1021/acs.langmuir.7b01068

PMID:28585831

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5489958/

Abstract

We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + HSO cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal-sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours.

摘要

我们通过在多晶钌薄膜上沉积自组装单层（SAM）来修饰和稳定钌表面。研究了这些单层的生长机制、动力学和稳定性。在环境条件下沉积的 SAM 在经过过氧酸清洁和过氧酸 + HSO 清洁的基底上与在 H 自由基清洁的 Ru 表面上形成的单层进行了比较。我们发现，H 自由基清洁的 Ru 上的烷硫醇形成了密集排列的单层，当保存在氮气气氛中时仍然稳定。X 射线光电子能谱（XPS）显示出明显的硫峰（BE = 162.3 eV），对应于金属-硫键合。当暴露于环境条件时，SAM 在数小时内降解。