Forster Mark, Potter Richard J, Ling Yichuan, Yang Yi, Klug David R, Li Yat, Cowan Alexander J
University of Liverpool , Stephenson Institute for Renewable Energy , Department of Chemistry , Liverpool , L69 7ZF , United Kingdom . Email:
University of Liverpool , School of Engineering , George Holt Building , Brownlow Hill , Liverpool , L69 3GH , United Kingdom . Email:
Chem Sci. 2015 Jul 15;6(7):4009-4016. doi: 10.1039/c5sc00423c. Epub 2015 Apr 28.
Intrinsic doping of hematite through the inclusion of oxygen vacancies (V) is being increasingly explored as a simple, low temperature route to preparing active water splitting α-FeO photoelectrodes. Whilst it is widely accepted that the introduction of V leads to improved conductivities, little else is verified regarding the actual mechanism of enhancement. Here we employ transient absorption (TA) spectroscopy to build a comprehensive kinetic model for water oxidation on α-FeO . In contrast to previous suggestions, the primary effect of introducing V is to block very slow (ms) surface hole - bulk electron recombination pathways. In light of our mechanistic research we are also able to identify and address a cause of the high photocurrent onset potential, a common issue with this class of electrodes. Atomic layer deposition (ALD) of AlO is found to be particularly effective with α-FeO , leading to the photocurrent onset potential shifting by 200 mV. Significantly TA measurements on these ALD passivated electrodes also provide important insights into the role of passivating layers, that are relevant to the wider development of α-FeO photoelectrodes.
通过引入氧空位(V)对赤铁矿进行本征掺杂,正日益被视为一种制备活性水分解α-FeO光电极的简单低温途径。虽然人们普遍认为引入V会提高电导率,但关于增强的实际机制几乎没有其他得到验证。在此,我们采用瞬态吸收(TA)光谱法为α-FeO上的水氧化建立一个全面的动力学模型。与之前的观点相反,引入V的主要作用是阻断非常缓慢(毫秒级)的表面空穴-体相电子复合途径。根据我们的机理研究,我们还能够识别并解决高光电流起始电位的一个原因,这是这类电极常见的问题。发现AlO的原子层沉积(ALD)对α-FeO特别有效,导致光电流起始电位偏移200 mV。重要的是,对这些ALD钝化电极的TA测量也为钝化层的作用提供了重要见解,这与α-FeO光电极的更广泛发展相关。