Experimental Determination of the Ionization Energies of MoSe, WS, and MoS on SiO Using Photoemission Electron Microscopy.

The values of the ionization energies of transition metal dichalcogenides (TMDs) are needed to assess their potential usefulness in semiconductor heterojunctions for high-performance optoelectronics. Here, we report on the systematic determination of ionization energies for three prototypical TMD monolayers (MoSe, WS, and MoS) on SiO using photoemission electron microscopy with deep ultraviolet illumination. The ionization energy displays a progressive decrease from MoS, to WS, to MoSe, in agreement with predictions of density functional theory calculations. Combined with the measured energy positions of the valence band edge at the Brillouin zone center, we deduce that, in the absence of interlayer coupling, a vertical heterojunction comprising any of the three TMD monolayers would form a staggered (type-II) band alignment. This band alignment could give rise to long-lived interlayer excitons that are potentially useful for valleytronics or efficient electron-hole separation in photovoltaics.