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用开尔文探针力显微镜研究过渡金属二硫属化物单层与金属电极界面处的能级对齐。

Energy-Level Alignment at Interfaces between Transition-Metal Dichalcogenide Monolayers and Metal Electrodes Studied with Kelvin Probe Force Microscopy.

作者信息

Markeev Pavel A, Najafidehaghani Emad, Gan Ziyang, Sotthewes Kai, George Antony, Turchanin Andrey, de Jong Michel P

机构信息

MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands.

Institute of Physical Chemistry, Abbe Center of Photonics, Friedrich Schiller University, 07743 Jena, Germany.

出版信息

J Phys Chem C Nanomater Interfaces. 2021 Jun 24;125(24):13551-13559. doi: 10.1021/acs.jpcc.1c01612. Epub 2021 Jun 10.

DOI:10.1021/acs.jpcc.1c01612
PMID:34239657
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8237262/
Abstract

We studied the energy-level alignment at interfaces between various transition-metal dichalcogenide (TMD) monolayers, MoS, MoSe, WS, and WSe, and metal electrodes with different work functions (WFs). TMDs were deposited on SiO/silicon wafers by chemical vapor deposition and transferred to Al and Au substrates, with significantly different WFs to identify the metal-semiconductor junction behavior: oxide-terminated Al (natural oxidation) and Au (UV-ozone oxidation) with a WF difference of 0.8 eV. Kelvin probe force microscopy was employed for this study, based on which electronic band diagrams for each case were determined. We observed the Fermi-level pinning for MoS, while WSe/metal junctions behaved according to the Schottky-Mott limit. WS and MoSe exhibited intermediate behavior.

摘要

我们研究了各种过渡金属二硫属化物（TMD）单层（MoS、MoSe、WS和WSe）与具有不同功函数（WF）的金属电极之间界面处的能级对准情况。通过化学气相沉积将TMD沉积在SiO/硅片上，并转移到功函数差异显著的Al和Au衬底上，以识别金属-半导体结行为：具有0.8 eV功函数差异的氧化物终止的Al（自然氧化）和Au（紫外臭氧氧化）。本研究采用开尔文探针力显微镜，据此确定了每种情况下的电子能带图。我们观察到MoS的费米能级钉扎现象，而WSe/金属结的行为符合肖特基-莫特极限。WS和MoSe表现出中间行为。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/5aca79e05303/jp1c01612_0010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/b5712e22d6d8/jp1c01612_0002.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/3f41605a2cd2/jp1c01612_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/79a3dd75a519/jp1c01612_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/d4deb437cd22/jp1c01612_0008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/e9abc391f62c/jp1c01612_0009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/5aca79e05303/jp1c01612_0010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/b5712e22d6d8/jp1c01612_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/797b9f679e12/jp1c01612_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/4d1ff34e6b56/jp1c01612_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/53f38f6fe44e/jp1c01612_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/3f41605a2cd2/jp1c01612_0006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/79a3dd75a519/jp1c01612_0007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/d4deb437cd22/jp1c01612_0008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/e9abc391f62c/jp1c01612_0009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1888/8237262/5aca79e05303/jp1c01612_0010.jpg

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本文引用的文献

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