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补体基因表达与人额皮质厚度呈正相关。

Complement Gene Expression Correlates with Superior Frontal Cortical Thickness in Humans.

机构信息

Department of Psychology, Yale University.

Department of Medical Epidemiology and Biostatistics, Karolinska Institutet, Sweden.

出版信息

Neuropsychopharmacology. 2018 Feb;43(3):525-533. doi: 10.1038/npp.2017.164. Epub 2017 Jul 31.

Abstract

Recent work suggests that genes encoding complement proteins that are active in the innate immune system may confer risk for schizophrenia by disrupting typical synaptic pruning in late adolescence. Alterations in the complement pathway may contribute to aberrant cortical thinning in schizophrenia prodromes and reduced prefrontal cortical thickness in chronic schizophrenia patients; however, this theory needs to be translated to humans. We conducted a series of analyses in a sample of adult Swedish twins enriched for schizophrenia (N=129) to assess the plausibility of a relationship between complement gene expression and cortical thickness that could go awry in the etiology of schizophrenia. First, we identified that peripheral mRNA expression levels of two complement genes (C5, SERPING1) made unique contributions to the variance in superior frontal cortical thickness among all participants. Vertex-wise maps of the association between gene expression levels and thickness across the cortex suggested that this relationship was especially strong with SERPING1 in the superior frontal region, consistent with the pattern of disruption in cortical thickness observed in schizophrenia. Additional analyses identified that these genes are expressed in the human superior frontal cortex, that heritable genetic factors influence SERPING1 gene expression levels, and that these associations are observed regardless of case status. These findings provide initial evidence linking the complement system with cortical thinning in humans, a process potentially involved in the pathogenesis of schizophrenia.

摘要

最近的研究表明,在先天免疫系统中具有活性的补体蛋白基因可能通过破坏青春期后期的典型突触修剪而导致精神分裂症的风险。补体途径的改变可能导致精神分裂症前驱期皮质变薄和慢性精神分裂症患者前额皮质变薄;然而,这一理论需要在人类中进行验证。我们在一组富含精神分裂症的成年瑞典双胞胎样本中进行了一系列分析(N=129),以评估补体基因表达与皮质厚度之间的关系是否可能在精神分裂症的病因学中出现异常。首先,我们发现两种补体基因(C5、SERPING1)的外周 mRNA 表达水平对所有参与者的额上回皮质厚度的差异有独特的贡献。大脑皮质表面上基因表达水平与厚度之间的关联图谱表明,这种关系在额上回区域与 SERPING1 特别强,这与精神分裂症中观察到的皮质厚度破坏模式一致。进一步的分析表明,这些基因在人类额上回皮质中表达,遗传因素影响 SERPING1 基因的表达水平,而且这些关联与病例状态无关。这些发现为补体系统与人类皮质变薄之间的联系提供了初步证据,这一过程可能与精神分裂症的发病机制有关。

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