使用低折射率多孔二氧化硅薄膜提高表面等离子体共振传感器的品质因数
Figure of Merit Enhancement of a Surface Plasmon Resonance Sensor Using a Low-Refractive-Index Porous Silica Film.
作者信息
Meng Qing-Qing, Zhao Xin, Lin Cheng-You, Chen Shu-Jing, Ding Ying-Chun, Chen Zhao-Yang
机构信息
College of Science, Beijing University of Chemical Technology, Beijing 100029, China.
School of Materials Science and Technology, China University of Geosciences (Beijing), Beijing 100083, China.
出版信息
Sensors (Basel). 2017 Aug 10;17(8):1846. doi: 10.3390/s17081846.
In this paper; the surface plasmon resonance (SPR) sensor with a porous silica film was studied. The effect of the thickness and porosity of the porous silica film on the performance of the sensor was analyzed. The results indicated that the figure of merit (FOM) of an SPR sensor can be enhanced by using a porous silica film with a low-refractive-index. Particularly; the FOM of an SPR sensor with 40 nm thick 90% porosity porous silica film; whose refractive index is 1.04 was improved by 311% when compared with that of a traditional SPR sensor. Furthermore; it was found that the decrease in the refractive index or the increase in the thickness of the low-refractive-index porous silica film can enlarge the FOM enhancement. It is believed that the proposed SPR sensor with a low-refractive-index porous silica film will be helpful for high-performance SPR sensors development.
本文研究了带有多孔二氧化硅薄膜的表面等离子体共振（SPR）传感器。分析了多孔二氧化硅薄膜的厚度和孔隙率对传感器性能的影响。结果表明，通过使用低折射率的多孔二氧化硅薄膜可以提高SPR传感器的品质因数（FOM）。特别是，与传统SPR传感器相比，具有40nm厚、孔隙率为90%、折射率为1.04的多孔二氧化硅薄膜的SPR传感器的FOM提高了311%。此外，还发现低折射率多孔二氧化硅薄膜的折射率降低或厚度增加会扩大FOM增强效果。据信，所提出的带有低折射率多孔二氧化硅薄膜的SPR传感器将有助于高性能SPR传感器的开发。
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