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石墨烯/TMDs异质结构的制备及其光谱特性研究

Research on the Preparation and Spectral Characteristics of Graphene/TMDs Hetero-structures.

作者信息

Han Tao, Liu Hongxia, Wang Shulong, Chen Shupeng, Yang Kun

机构信息

Key Laboratory for Wide-Bandgap Semiconductor Materials and Devices of Education, the School of Microelectronics, Xidian University, Xi'an, 710071, China.

出版信息

Nanoscale Res Lett. 2020 Nov 25;15(1):219. doi: 10.1186/s11671-020-03439-1.

Abstract

The Van der Waals (vdWs) hetero-structures consist of two-dimensional materials have received extensive attention, which is due to its attractive electrical and optoelectronic properties. In this paper, the high-quality large-size graphene film was first prepared by the chemical vapor deposition (CVD) method; then, graphene film was transferred to SiO/Si substrate; next, the graphene/WS and graphene/MoS hetero-structures were prepared by the atmospheric pressure chemical vapor deposition method, which can be achieved by directly growing WS and MoS material on graphene/SiO/Si substrate. Finally, the test characterization of graphene/TMDs hetero-structures was performed by AFM, SEM, EDX, Raman and PL spectroscopy to obtain and grasp the morphology and luminescence laws. The test results show that graphene/TMDs vdWs hetero-structures have the very excellent film quality and spectral characteristics. There is the built-in electric field at the interface of graphene/TMDs heterojunction, which can lead to the effective separation of photo-generated electron-hole pairs. Monolayer WS and MoS material have the strong broadband absorption capabilities, the photo-generated electrons from WS can transfer to the underlying p-type graphene when graphene/WS hetero-structures material is exposed to the light, and the remaining holes can induced the light gate effect, which is contrast to the ordinary semiconductor photoconductors. The research on spectral characteristics of graphene/TMDs hetero-structures can pave the way for the application of novel optoelectronic devices.

摘要

由二维材料组成的范德华(vdWs)异质结构因其具有吸引人的电学和光电特性而受到广泛关注。本文首先通过化学气相沉积(CVD)法制备了高质量的大尺寸石墨烯薄膜;然后,将石墨烯薄膜转移到SiO/Si衬底上;接下来,通过大气压化学气相沉积法制备了石墨烯/WS和石墨烯/MoS异质结构,这可以通过在石墨烯/SiO/Si衬底上直接生长WS和MoS材料来实现。最后,通过原子力显微镜(AFM)、扫描电子显微镜(SEM)、能谱仪(EDX)、拉曼光谱和光致发光(PL)光谱对石墨烯/TMDs异质结构进行测试表征,以获得并掌握其形貌和发光规律。测试结果表明,石墨烯/TMDs vdWs异质结构具有非常优异的薄膜质量和光谱特性。在石墨烯/TMDs异质结界面处存在内建电场,这可导致光生电子 - 空穴对的有效分离。单层WS和MoS材料具有很强的宽带吸收能力,当石墨烯/WS异质结构材料受到光照时,来自WS的光生电子可以转移到下层的p型石墨烯上,而剩余的空穴可以诱导光门效应,这与普通半导体光电导体不同。对石墨烯/TMDs异质结构光谱特性的研究可为新型光电器件的应用铺平道路。

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