Cole Matthew T, Milne William I
Department of Engineering, Cambridge University, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK.
AIXTRON Ltd., Cambridge CB24 4FQ, UK.
Materials (Basel). 2013 May 31;6(6):2262-2273. doi: 10.3390/ma6062262.
A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child's law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm with linear packing densities of up to ~5 × 10⁴ cm. These results open up the potential for multi-directional alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.
已开发出一种等离子体增强化学气相沉积反应器，用于合成水平排列的碳纳米管。基于无碰撞、准中性的Child定律离子鞘对排列鞘层的宽度进行了建模，通过直接的朗缪尔探针测量对这些估计进行了经验验证，从而证实了所提出的反应器将现有鞘层场扩展至7毫米的能力。7毫巴的生长气氛与25瓦的等离子体相结合，使得碳纳米管能够在约0.04 V/μm的电场下同时生长和排列，线性堆积密度高达约5×10⁴/cm。这些结果为碳纳米管的多方向排列开辟了潜力，为制造许多新型光电器件提供了一条可行途径。
