Clinical Department, School of Dentistry, PUCRS - Pontifícia Universidade Católica do Rio Grande do Sul, Rio Grande do Sul, 90619-900, Brazil.
Graduate Program, School of Dentistry, PUCRS - Pontifícia Universidade Católica do Rio Grande do Sul, Rio Grande do Sul, 90619-900, Brazil.
J Esthet Restor Dent. 2017 Nov 12;29(6):450-458. doi: 10.1111/jerd.12326. Epub 2017 Sep 11.
The aim of this study was to evaluate the surface roughness and analyze the surface topography of five different CAD/CAM ceramics and one CAD/CAM composite resin for CEREC after milling and postmilling procedures.
Blocks of the ceramics Mark II, IPS Empress CAD, IPS e.max CAD, Suprinity and Enamic, and blocks of the composite resin Lava Ultimate were milled at CEREC MCXL. Ten flat samples of each material were obtained. The surface roughness (Ra) test was performed before and after milling, crystallization, polishing, and glaze when indicated, followed by SEM and AFM analysis. Data were submitted to one-way ANOVA with repeated measures and the Tukey HSD test (α = 0.05).
The milling step significantly increased the roughness of all the tested materials (P < .05). Lithium-based ceramics (IPS e.max CAD and Suprinity) were more suitable to roughness than the other tested materials (P < .05).
The polishing methods were able to reduce roughness to baseline values, except for lithium-based ceramics. Glaze reduced significantly the roughness of lithium-based ceramics without a difference from the baseline. SEM and AFM images revealed that glazed surfaces are smoother than polished surfaces.
All hard-milling CAD/CAM materials, that is, fully sintered, should be only hand polished. The glaze step can be suppressed resulting in time saving. However, the glaze step in soft-milling lithium disilicate is imperative.
本研究旨在评估 5 种不同 CAD/CAM 陶瓷和 1 种 CAD/CAM 复合树脂经铣削和后铣削处理后 CEREC 的表面粗糙度,并分析其表面形貌。
采用 CEREC MCXL 对 Mark II、IPS Empress CAD、IPS e.max CAD、Suprinity 和 Enamic 陶瓷以及 Lava Ultimate 复合树脂进行铣削,获得每种材料的 10 个平面样本。分别对铣削前后、结晶、抛光和上釉(如适用)后的表面粗糙度(Ra)进行测试,随后进行 SEM 和 AFM 分析。数据采用单向方差分析(ANOVA)和重复测量 Tukey HSD 检验(α=0.05)。
铣削步骤显著增加了所有测试材料的粗糙度(P<0.05)。锂基陶瓷(IPS e.max CAD 和 Suprinity)比其他测试材料更适合粗糙度(P<0.05)。
除了锂基陶瓷之外,所有的抛光方法都能将粗糙度降低到基线值。上釉显著降低了锂基陶瓷的粗糙度,与基线值无差异。SEM 和 AFM 图像显示,上釉表面比抛光表面更光滑。
所有硬铣削 CAD/CAM 材料,即完全烧结材料,只能进行手工抛光。可以省略上釉步骤以节省时间。然而,软铣削的锂硅玻璃陶瓷必须进行上釉。