Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University , Beijing 100084, China.
ACS Appl Mater Interfaces. 2017 Oct 4;9(39):34064-34070. doi: 10.1021/acsami.7b09710. Epub 2017 Sep 21.
Redox-based memristor devices, which are considered to have promising nonvolatile memory, mainly operate through the formation/rupture of nanoscale conductive filaments. However, the random growth of conductive filaments is an obstacle for the stability of memory devices and the cell-to-cell uniformity. Here, we investigate the guiding effect of nanoindentation on the growth of conductive filaments in resistive memory devices. The nanoindented top electrodes generate an electric field concentration and the resultant precise control of a conductive filament in two typical memory devices, Ag/SiO/Pt and W/TaO/Pt. The nanoindented cells possess a much larger ON/OFF ratio, a sharper RESET process, a higher response speed, and better cell-to-cell uniformity compared with the conventional cells. Our finding reflects that the use of large-scale nanotransfer printing might be a unique way to improve the performance of resistive random access memory.
基于氧化还原的忆阻器被认为具有有前途的非易失性存储器,主要通过纳米级导电丝的形成/断裂来工作。然而,导电丝的随机生长是记忆器件稳定性和单元间一致性的障碍。在这里,我们研究了纳米压痕对阻变存储器中导电丝生长的引导作用。纳米压痕的顶电极产生了电场集中,从而精确控制了两种典型的忆阻器件(Ag/SiO/Pt 和 W/TaO/Pt)中的导电丝。与传统单元相比,纳米压痕单元具有更大的 ON/OFF 比、更陡峭的 RESET 过程、更高的响应速度和更好的单元间一致性。我们的发现反映了使用大规模纳米压印转移可能是一种独特的方法,可以提高阻变随机存取存储器的性能。