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多晶ZnO基电阻开关器件中银导电细丝的透射电子显微镜纳米结构研究

TEM Nanostructural Investigation of Ag-Conductive Filaments in Polycrystalline ZnO-Based Resistive Switching Devices.

作者信息

Bejtka Katarzyna, Milano Gianluca, Ricciardi Carlo, Pirri Candido F, Porro Samuele

机构信息

Center for Sustainable Future Technologies @ POLITO, Istituto Italiano di Tecnologia, Via Livorno 60, Turin 10144, Italy.

Department of Applied Science and Technology, Politecnico di Torino, C.so Duca degli Abruzzi 24, Turin 10129, Italy.

出版信息

ACS Appl Mater Interfaces. 2020 Jul 1;12(26):29451-29460. doi: 10.1021/acsami.0c05038. Epub 2020 Jun 22.

Abstract

Memristive devices based on a resistive switching mechanism are considered very promising for nonvolatile memory and unconventional computing applications, even though many details of the switching mechanisms are not yet fully understood. Here, we report a nanostructural study by means of high-resolution transmission electron microscopy and spectroscopy techniques of a Ag/ZnO/Pt memristive device. To ease the localization of the filament position for its characterization, we propose to use the guiding effect of regular perturbation arrays obtained by FIB technology to assist the filament formation. HRTEM and EDX were used to identify the composition and crystalline structure of the so-obtained conductive filaments and surrounding regions. It was determined that the conducting paths are composed mainly of monocrystalline Ag, which remains polycrystalline in some circumstances, including the zone where the switching occurs and at secondary filaments created at the grain boundaries of the polycrystalline ZnO matrix. We also observed that the ZnO matrix shows a degraded quality in the switching zone, while it remains unaltered in the rest of the memristive device.

摘要

基于电阻开关机制的忆阻器件被认为在非易失性存储器和非常规计算应用方面极具潜力,尽管开关机制的许多细节尚未完全明了。在此,我们通过高分辨率透射电子显微镜和光谱技术对Ag/ZnO/Pt忆阻器件进行了纳米结构研究。为便于表征细丝位置,我们提议利用聚焦离子束技术获得的规则扰动阵列的引导效应来辅助细丝形成。高分辨透射电子显微镜和能谱分析用于识别如此获得的导电细丝及其周围区域的组成和晶体结构。已确定导电路径主要由单晶银组成,在某些情况下银仍为多晶,包括开关发生区域以及在多晶ZnO基体晶界处形成的次级细丝区域。我们还观察到,ZnO基体在开关区域质量下降,而在忆阻器件的其余部分保持不变。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9164/8008384/931ac331adbc/am0c05038_0001.jpg

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