Department of Microsystems Engineering (IMTEK), University of Freiburg , Georges-Köhler Allee 103, 79110 Freiburg, Germany.
ACS Nano. 2017 Sep 26;11(9):8537-8541. doi: 10.1021/acsnano.7b05593. Epub 2017 Sep 14.
In photolithographic processes, the light inducing the photochemical reactions is confined to a small volume, which enables direct writing of micro- and nanoscale features onto solid surfaces without the need of a predefined photomask. The direct writing process can be used to generate topographic patterns through photopolymerization or photo-cross-linking or can be employed to use light to generate chemical patterns on the surface with high spatial control, which would make such processes attractive for bioapplications. The prospects of maskless photolithography technologies with a focus on two-photon lithography and scanning-probe-based photochemical processes based on scanning near-field optical microscopy or beam pen lithography are discussed.
在光刻工艺中，引发光化学反应的光被限制在一个小体积内，这使得可以直接在固体表面上写入微纳尺度的特征，而无需使用预定义的光刻掩模。直接写入过程可用于通过光聚合或光交联来生成形貌图案，或者可用于利用光在表面上生成具有高空间控制的化学图案，这使得此类过程在生物应用中具有吸引力。讨论了无掩模光刻技术的前景，重点是双光子光刻和基于扫描近场光学显微镜或光束笔光刻的扫描探针基光化学过程。
