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TiF4 对牙釉质表面作用机制的研究:扫描电镜/能谱分析、KOH 可溶氟及 X 射线衍射分析。

Mechanism of Action of TiF4 on Dental Enamel Surface: SEM/EDX, KOH-Soluble F, and X-Ray Diffraction Analysis.

出版信息

Caries Res. 2017;51(6):554-567. doi: 10.1159/000479038. Epub 2017 Oct 12.

DOI:10.1159/000479038
PMID:29020673
Abstract

This in vitro study aimed to evaluate the action of TiF4 on sound and carious bovine and human enamel. Sound (S) and pre-demineralised (DE) bovine and human (primary and permanent) enamel samples were treated with TiF4 (pH 1.0) or NaF varnishes (pH 5.0), containing 0.95, 1.95, or 2.45% F for 12 h. The enamel surfaces were analysed using SEM-EDX (scanning electron microscopy/energy-dispersive X-ray spectroscopy) (n = 10, 5 S and 5 DE) and KOH-soluble fluoride was quantified (n = 20, 10 S and 10 DE). Hydroxyapatite powder produced by precipitation method was treated with the corresponding fluoride solutions for 1 min (n = 2). The formed compounds were detected using X-ray diffraction (XRD). All TiF4 varnishes produced a coating layer rich in Ti and F on all types of enamel surface, with micro-cracks in its extension. TiF4 (1.95 and 2.45% F) provided higher fluoride deposition than NaF, especially for bovine enamel (p < 0.0001). It also induced a higher fluoride deposition on DE samples compared to S samples (p < 0.0001), except for primary enamel. The Ti content was higher for bovine and human primary enamel than human permanent enamel, with some differences between S and DE. The XRD analysis showed that TiF4 induced the formation of new compounds such as CaF2, TiO2, and Ti(HPO4)2·H2O. In conclusion, TiF4 (>0.95% F) interacts better, when compared to NaF, with bovine and human primary enamel than with human permanent enamel. TiF4 provoked higher F deposition compared to NaF. Carious enamel showed higher F uptake than sound enamel by TiF4 application, while Ti uptake was dependent on the enamel condition and origin.

摘要

本体外研究旨在评估 TiF4 对正常和脱矿牛牙和人牙釉质的作用。将正常(S)和预脱矿(DE)牛牙和人牙(乳牙和恒牙)釉质样本(n = 10,每组 5 个 S 和 5 个 DE)用 TiF4(pH 1.0)或 NaF 清漆(pH 5.0)处理,含 0.95、1.95 或 2.45% F 处理 12 小时。用 SEM-EDX(扫描电子显微镜/能量色散 X 射线光谱)分析釉质表面(n = 10,每组 5 个 S 和 5 个 DE),并用 KOH 可溶氟定量(n = 20,每组 10 个 S 和 10 个 DE)。用沉淀法制备的羟基磷灰石粉末用相应的氟化物溶液处理 1 分钟(n = 2)。用 X 射线衍射(XRD)检测形成的化合物。所有 TiF4 清漆在所有类型的釉质表面上均形成富含 Ti 和 F 的涂层,其延伸部分有微裂纹。TiF4(1.95% 和 2.45% F)比 NaF 提供更高的氟沉积,尤其是对牛牙釉质(p < 0.0001)。它还诱导 DE 样本比 S 样本(p < 0.0001)有更高的氟沉积,乳牙除外。牛牙和人乳牙的 Ti 含量高于人恒牙,S 样本和 DE 样本之间也存在一些差异。XRD 分析表明,TiF4 诱导了新化合物的形成,如 CaF2、TiO2 和 Ti(HPO4)2·H2O。总之,与 NaF 相比,TiF4 与牛牙和人乳牙的相互作用优于人恒牙。TiF4 比 NaF 引起更高的 F 沉积。与正常釉质相比,用 TiF4 处理时,龋釉质的 F 摄取量更高,而 Ti 摄取量取决于釉质状况和来源。

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