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范德华异质结构中 MoS 和石墨烯的界面相互作用。

Interfacial Interactions in van der Waals Heterostructures of MoS and Graphene.

机构信息

Key Laboratory of Flexible Electronics (KLOFE) and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing Tech University , 30 South Puzhu Road, Nanjing 211816, P.R. China.

Center for Programmable Materials, School of Materials Science and Engineering, Nanyang Technological University , 50 Nanyang Avenue, Singapore 639798, Singapore.

出版信息

ACS Nano. 2017 Nov 28;11(11):11714-11723. doi: 10.1021/acsnano.7b07015. Epub 2017 Oct 31.

Abstract

Interfacial coupling between neighboring layers of van der Waals heterostructures (vdWHs), formed by vertically stacking more than two types of two-dimensional materials (2DMs), greatly affects their physical properties and device performance. Although high-resolution cross-sectional scanning tunneling electron microscopy can directly image the atomically sharp interfaces in the vdWHs, the interfacial coupling and lattice dynamics of vdWHs formed by two different types of 2DMs, such as semimetal and semiconductor, are not clear so far. Here, we report the ultralow-frequency Raman spectroscopy investigation on interfacial couplings in the vdWHs formed by graphene and MoS flakes. Because of the significant interfacial layer-breathing couplings between MoS and graphene flakes, a series of layer-breathing modes with frequencies dependent on their layer numbers are observed in the vdWHs, which can be described by the linear chain model. It is found that the interfacial layer-breathing force constant between MoS and graphene, α(I) = 60 × 10 N/m, is comparable with the layer-breathing force constant of multilayer MoS and graphene. The results suggest that the interfacial layer-breathing couplings in the vdWHs formed by MoS and graphene flakes are not sensitive to their stacking order and twist angle between the two constituents. Our results demonstrate that the interfacial interlayer coupling in vdWHs formed by two-dimensional semimetals and semiconductors can lead to new lattice vibration modes, which not only can be used to measure the interfacial interactions in vdWHs but also is beneficial to fundamentally understand the properties of vdWHs for further engineering the vdWHs-based electronic and photonic devices.

摘要

范德华异质结构(vdWH)中相邻层之间的界面耦合,是通过垂直堆叠两种以上的二维材料(2DM)形成的,极大地影响了它们的物理性质和器件性能。虽然高分辨率的横截面扫描隧道电子显微镜可以直接观察 vdWH 中原子级尖锐的界面,但到目前为止,由两种不同类型的 2DM 形成的 vdWH 的界面耦合和晶格动力学还不清楚,例如金属和半导体。在这里,我们报告了在由石墨烯和 MoS 薄片形成的 vdWH 中界面耦合的超低频拉曼光谱研究。由于 MoS 和石墨烯薄片之间存在显著的界面层呼吸耦合,在 vdWH 中观察到一系列与层数量相关的层呼吸模式,这些模式可以用线性链模型来描述。结果发现,MoS 和石墨烯之间的界面层呼吸力常数α(I)= 60 × 10 N/m,与多层 MoS 和石墨烯的层呼吸力常数相当。结果表明,由 MoS 和石墨烯薄片形成的 vdWH 中的界面层呼吸耦合对它们的堆叠顺序和两个组成部分之间的扭转角不敏感。我们的结果表明,由二维金属和半导体形成的 vdWH 中的界面层间耦合可以导致新的晶格振动模式,这不仅可以用于测量 vdWH 中的界面相互作用,还有助于从根本上理解 vdWH 的性质,从而进一步工程化基于 vdWH 的电子和光子器件。

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