Hu Lili, Shan Xinyan, Wu Yanling, Zhao Jimin, Lu Xinghua
Institute of Physics, Chinese Academy of Sciences, Beijing, 100190, China.
School of Physical Sciences, University of Chinese Academy of Sciences, Beijing, 100049, China.
Sci Rep. 2017 Nov 14;7(1):15538. doi: 10.1038/s41598-017-15350-4.
The recently discovered novel properties of two dimensional materials largely rely on the layer-critical variation in their electronic structure and lattice symmetry. Achieving layer-by-layer precision patterning is thus crucial for junction fabrications and device engineering, which hitherto poses an unprecedented challenge. Here we demonstrate laser thinning and patterning with layer-by-layer precision in a two dimensional (2D) quantum material MoS. Monolayer, bilayer and trilayer of MoS films are produced with precise vertical and lateral control, which removes the extruding barrier for fabricating novel three dimensional (3D) devices composed of diverse layers and patterns. By tuning the laser fluence and exposure time we demonstrate producing MoS patterns with designed layer numbers. The underlying physics mechanism is identified to be temperature-dependent evaporation of the MoS lattice, verified by our measurements and calculations. Our investigation paves way for 3D device fabrication based on 2D layered quantum materials.
二维材料最近发现的新奇特性很大程度上依赖于其电子结构和晶格对称性的层临界变化。因此，实现逐层精确图案化对于结制造和器件工程至关重要，而这迄今为止带来了前所未有的挑战。在此，我们展示了在二维（2D）量子材料MoS₂中进行逐层精确的激光减薄和图案化。通过精确的垂直和横向控制制备出了单层、双层和三层的MoS₂薄膜，这消除了制造由不同层和图案组成的新型三维（3D）器件的阻碍。通过调节激光能量密度和曝光时间，我们展示了能够制备出具有设计层数的MoS₂图案。经测量和计算验证，其潜在物理机制被确定为MoS₂晶格的温度依赖性蒸发。我们的研究为基于二维层状量子材料的三维器件制造铺平了道路。
