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相位掩膜对准是否正在使您的受激发射损耗(STED)显微镜产生像差?

Is phase-mask alignment aberrating your STED microscope?

作者信息

Patton Brian R, Burke Daniel, Vrees Robert, Booth Martin J

机构信息

Centre for Neural Circuits and Behaviour, University of Oxford, Mansfield Road, Oxford OX1 3SR, UK.

出版信息

Methods Appl Fluoresc. 2015 Mar 27;3(2):024002. doi: 10.1088/2050-6120/3/2/024002.

Abstract

The performance of a stimulated emission depletion (STED) microscope depends critically upon the pupil plane phase mask that is used to shape the depletion focus. Misalignments of the mask create unwanted distortions of the depletion focus to the detriment of image quality. It is shown how the phase errors introduced by a misplaced mask are similar to coma aberrations. The effects are investigated analytically, through numerical modelling and experimental measurement. Strategies for the systematic alignment of the masks are discussed.

摘要

受激辐射损耗(STED)显微镜的性能严重依赖于用于塑造损耗焦点的光瞳平面相位掩模。掩模的未对准会导致损耗焦点产生不必要的畸变,从而损害图像质量。研究表明,放置不当的掩模引入的相位误差类似于彗差。通过数值建模和实验测量对这些效应进行了分析研究。讨论了掩模系统对准的策略。

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