Tsay Chien-Yie, Hsu Wei-Tse
Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan.
Materials (Basel). 2017 Dec 1;10(12):1379. doi: 10.3390/ma10121379.
ZnO, Al-doped ZnO (AZO), and Ga-doped ZnO (GZO) semiconductor thin films were deposited on glass substrates via a sol-gel spin-coating process for application in a photoconductive ultraviolet (UV) detector. The doping concentrations of Al and Ga were 1.0 at % in the precursor solutions. In this study, the microstructural features and the optical and electrical properties of sol-gel-derived ZnO, AZO, and GZO thin films were compared, and the performance of ZnO-based UV photodetectors under ultraviolet A (UVA) light were measured. Experimental results confirmed the synthesis of single-phase nanocrystalline ZnO-based thin films and the successful substitution of Al and Ga into Zn sites in ZnO crystals. The results also demonstrated that the optical transmittance and electrical properties of ZnO thin films could be improved by Al and Ga doping. UV photodetectors based on ZnO-based thin films, having a metal-semiconductor-metal (MSM) configuration, were fabricated with Al inter-digitated electrodes. All photodetectors showed an ohmic nature between semiconductor and electrode contacts and exhibited a sharp increase in photocurrent under illumination with UVA light. We found that the MSM UV photodetector based on the GZO semiconductor thin film exhibited the best UV response (/) of 73.3 and the highest photocurrent responsivity of 46.2 A/W under UVA light (power density ~0.825 mW/cm²) at 5 V bias.
通过溶胶-凝胶旋涂工艺在玻璃基板上沉积了氧化锌(ZnO)、铝掺杂氧化锌(AZO)和镓掺杂氧化锌(GZO)半导体薄膜,用于光导紫外(UV)探测器。前驱体溶液中铝和镓的掺杂浓度均为1.0原子百分比。在本研究中,比较了溶胶-凝胶法制备的ZnO、AZO和GZO薄膜的微观结构特征以及光学和电学性质,并测量了基于ZnO的紫外探测器在紫外A(UVA)光下的性能。实验结果证实了单相纳米晶ZnO基薄膜的合成以及铝和镓成功取代了ZnO晶体中的锌位点。结果还表明,铝和镓掺杂可以改善ZnO薄膜的光学透过率和电学性质。采用铝叉指电极制备了具有金属-半导体-金属(MSM)结构的基于ZnO基薄膜的紫外探测器。所有探测器在半导体与电极接触之间均表现出欧姆特性,并且在UVA光照射下光电流急剧增加。我们发现,基于GZO半导体薄膜的MSM紫外探测器在5V偏压下,在UVA光(功率密度约0.825mW/cm²)照射下表现出最佳的紫外响应(/)为73.3,最高的光电流响应率为46.2A/W。