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不同界面限制条件下硅/锗核壳纳米线中载流子迁移率增强的调制

Modulation of the carrier mobility enhancement in Si/Ge core-shell nanowires under different interface confinements.

作者信息

He Yan, Ouyang Gang

机构信息

Key Laboratory of Low-Dimensional Quantum Structures and Quantum Control of Ministry of Education, Synergetic Innovation Center for Quantum Effects and Applications (SICQEA), Hunan Normal University, Changsha, 410081, China.

出版信息

Phys Chem Chem Phys. 2018 Feb 7;20(6):3888-3894. doi: 10.1039/c7cp08259b.

Abstract

The theoretical analysis of the effect of interface confinement on the enhancement of carrier mobility in Si nanowires (SiNWs) is one of the critical aspects in the design and development of high efficiency Si-based optoelectronic devices. Herein, we propose an analytical method for SiNWs under different interface confinements in terms of the atomic-bond-relaxation correlation mechanism and continuum medium mechanics. Moreover, an analytical expression for the relationship between carrier mobility and bond identities is derived and the results are validated with the related experimental measurements. It is found that the size reduction of SiNWs can not only increase the energy bandgap, but also enhance the phonon and surface roughness scattering, thereby allowing for the depression of carrier mobility. Moreover, the underlying mechanism regarding the temperature dependent-carrier mobility in SiNWs with different orientations embedded within Ge coating layers is clarified, which provides a pathway to modulate the transport properties in Si-based nanostructures for desirable applications.

摘要

界面限制对硅纳米线(SiNWs)中载流子迁移率增强作用的理论分析是高效硅基光电器件设计与开发的关键环节之一。在此,我们基于原子键弛豫相关机制和连续介质力学,针对不同界面限制条件下的硅纳米线提出了一种分析方法。此外,推导了载流子迁移率与键特性之间的解析表达式,并通过相关实验测量对结果进行了验证。研究发现,硅纳米线尺寸减小不仅会增加能带隙,还会增强声子和表面粗糙度散射,从而导致载流子迁移率降低。此外,阐明了嵌入锗涂层中不同取向的硅纳米线中与温度相关的载流子迁移率的潜在机制,这为调控硅基纳米结构中的输运特性以实现理想应用提供了一条途径。

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