Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, College of Physical Science and Technology, Xiamen University, Xiamen 361005, China.
Nanoscale. 2018 Mar 1;10(9):4361-4369. doi: 10.1039/c7nr08035b.
Hexagonal boron nitride (h-BN) is the widest band gap 2D material (>6 eV), which has attracted extensive attention. For exploring potential applications in optoelectronic devices, electrical conductivity modulation (n or p type) is of extreme importance. Here, we report the achievement of a large-scale and high quality h-BN monolayer with p-type conductivity by modulation doping of Mg using a low pressure chemical vapor deposition method. A large-scale monolayer h-BN (>10 inches) was grown by using a wound Cu foil roll on a multi-prong quartz fork. Magnesium nitride is used as a dopant precursor in a separate line due to its appropriate melting point and decomposition temperature. Density functional theory calculations revealed that the acceptor level introduced by Mg is almost pinned into the valence band and the activated holes are highly delocalized into the surrounding h-BN lattices. The h-BN:Mg monolayer showed a p-type conductivity with a considerable surface current of over 12 μA and a hole density of 1.7 × 10 cm. The dielectrically tunable h-BN monolayer makes the fabrication of advanced 2D optoelectronic devices in short wavelength possible.
六方氮化硼(h-BN)是宽带隙二维材料(>6eV),受到广泛关注。为了探索在光电器件中的潜在应用,电导率调制(n 型或 p 型)非常重要。在这里,我们通过低压化学气相沉积法用镁进行调制掺杂,报告了实现大面积高质量 p 型导电 h-BN 单层的成果。采用卷绕在多叉石英叉上的铜箔卷,使用低压化学气相沉积法生长出了大面积的单层 h-BN(>10 英寸)。由于氮化镁具有适当的熔点和分解温度,因此将其用作掺杂剂前体,在单独的线路中使用。密度泛函理论计算表明,Mg 引入的受主能级几乎被钉扎在价带中,激活的空穴高度离域到周围的 h-BN 晶格中。h-BN:Mg 单层表现出 p 型导电性,表面电流超过 12μA,空穴密度为 1.7×10cm。介电可调谐 h-BN 单层使得在短波长下制造先进的二维光电设备成为可能。