Mballo Adama, Srivastava Ashutosh, Sundaram Suresh, Vuong Phuong, Karrakchou Soufiane, Halfaya Yacine, Gautier Simon, Voss Paul L, Ahaitouf Ali, Salvestrini Jean Paul, Ougazzaden Abdallah
CNRS, UMI 2958, GT-CNRS, 2 rue Marconi, 57070 Metz, France.
School of Electrical and Computer Engineering, Georgia Institute of Technology, GT-Lorraine, 57070 Metz, France.
Nanomaterials (Basel). 2021 Jan 15;11(1):211. doi: 10.3390/nano11010211.
Reliable p-doped hexagonal boron nitride (h-BN) could enable wide bandgap optoelectronic devices such as deep ultra-violet light emitting diodes (UV LEDs), solar blind photodiodes and neutron detectors. We report the study of Mg in h-BN layers as well as Mg h-BN/AlGaN heterostructures. Mg incorporation in h-BN was studied under different biscyclopentadienyl-magnesium (Cp2Mg) molar flow rates. 2θ-ω x-ray diffraction scans clearly evidence a single peak, corresponding to the (002) reflection plane of h-BN with a full-width half maximum increasing with Mg incorporation in h-BN. For a large range of Cp2Mg molar flow rates, the surface of Mg doped h-BN layers exhibited characteristic pleats, confirming that Mg doped h-BN remains layered. Secondary ion mass spectrometry analysis showed Mg incorporation, up to 4 × 10 /cm in h-BN. Electrical conductivity of Mg h-BN increased with increased Mg-doping. Heterostructures of Mg h-BN grown on n-type Al rich AlGaN (58% Al content) were made with the intent of forming a p-n heterojunction. The I-V characteristics revealed rectifying behavior for temperatures from 123 to 423 K. Under ultraviolet illumination, photocurrent was generated, as is typical for p-n diodes. C-V measurements evidence a built-in potential of 3.89 V. These encouraging results can indicate p-type behavior, opening a pathway for a new class of wide bandgap p-type layers.
可靠的p型掺杂六方氮化硼(h-BN)能够实现宽带隙光电器件,如深紫外发光二极管(UV LED)、日盲光电二极管和中子探测器。我们报道了对h-BN层中镁以及Mg h-BN/AlGaN异质结构的研究。在不同的双环戊二烯基镁(Cp2Mg)摩尔流速下研究了h-BN中镁的掺入情况。2θ-ω X射线衍射扫描清楚地显示出一个单一峰,对应于h-BN的(002)反射面,其半高宽随着h-BN中镁的掺入而增加。对于大范围的Cp2Mg摩尔流速,Mg掺杂h-BN层的表面呈现出特征性褶皱,证实Mg掺杂h-BN仍保持层状结构。二次离子质谱分析表明h-BN中镁的掺入量高达4×10/cm。Mg h-BN的电导率随着镁掺杂量的增加而增加。在n型富铝AlGaN(铝含量58%)上生长Mg h-BN异质结构,目的是形成p-n异质结。I-V特性显示在123至423 K的温度范围内具有整流行为。在紫外光照下,产生了光电流,这是p-n二极管的典型现象。C-V测量证明内建电势为3.89 V。这些令人鼓舞的结果表明了p型行为,为一类新型宽带隙p型层开辟了一条途径。