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迈向六方氮化硼中的P型导电:hBN/AlGaN异质结的掺杂研究与电学测量分析

Towards P-Type Conduction in Hexagonal Boron Nitride: Doping Study and Electrical Measurements Analysis of hBN/AlGaN Heterojunctions.

作者信息

Mballo Adama, Srivastava Ashutosh, Sundaram Suresh, Vuong Phuong, Karrakchou Soufiane, Halfaya Yacine, Gautier Simon, Voss Paul L, Ahaitouf Ali, Salvestrini Jean Paul, Ougazzaden Abdallah

机构信息

CNRS, UMI 2958, GT-CNRS, 2 rue Marconi, 57070 Metz, France.

School of Electrical and Computer Engineering, Georgia Institute of Technology, GT-Lorraine, 57070 Metz, France.

出版信息

Nanomaterials (Basel). 2021 Jan 15;11(1):211. doi: 10.3390/nano11010211.

Abstract

Reliable p-doped hexagonal boron nitride (h-BN) could enable wide bandgap optoelectronic devices such as deep ultra-violet light emitting diodes (UV LEDs), solar blind photodiodes and neutron detectors. We report the study of Mg in h-BN layers as well as Mg h-BN/AlGaN heterostructures. Mg incorporation in h-BN was studied under different biscyclopentadienyl-magnesium (Cp2Mg) molar flow rates. 2θ-ω x-ray diffraction scans clearly evidence a single peak, corresponding to the (002) reflection plane of h-BN with a full-width half maximum increasing with Mg incorporation in h-BN. For a large range of Cp2Mg molar flow rates, the surface of Mg doped h-BN layers exhibited characteristic pleats, confirming that Mg doped h-BN remains layered. Secondary ion mass spectrometry analysis showed Mg incorporation, up to 4 × 10 /cm in h-BN. Electrical conductivity of Mg h-BN increased with increased Mg-doping. Heterostructures of Mg h-BN grown on n-type Al rich AlGaN (58% Al content) were made with the intent of forming a p-n heterojunction. The I-V characteristics revealed rectifying behavior for temperatures from 123 to 423 K. Under ultraviolet illumination, photocurrent was generated, as is typical for p-n diodes. C-V measurements evidence a built-in potential of 3.89 V. These encouraging results can indicate p-type behavior, opening a pathway for a new class of wide bandgap p-type layers.

摘要

可靠的p型掺杂六方氮化硼(h-BN)能够实现宽带隙光电器件,如深紫外发光二极管(UV LED)、日盲光电二极管和中子探测器。我们报道了对h-BN层中镁以及Mg h-BN/AlGaN异质结构的研究。在不同的双环戊二烯基镁(Cp2Mg)摩尔流速下研究了h-BN中镁的掺入情况。2θ-ω X射线衍射扫描清楚地显示出一个单一峰,对应于h-BN的(002)反射面,其半高宽随着h-BN中镁的掺入而增加。对于大范围的Cp2Mg摩尔流速,Mg掺杂h-BN层的表面呈现出特征性褶皱,证实Mg掺杂h-BN仍保持层状结构。二次离子质谱分析表明h-BN中镁的掺入量高达4×10/cm。Mg h-BN的电导率随着镁掺杂量的增加而增加。在n型富铝AlGaN(铝含量58%)上生长Mg h-BN异质结构,目的是形成p-n异质结。I-V特性显示在123至423 K的温度范围内具有整流行为。在紫外光照下,产生了光电流,这是p-n二极管的典型现象。C-V测量证明内建电势为3.89 V。这些令人鼓舞的结果表明了p型行为,为一类新型宽带隙p型层开辟了一条途径。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3700/7829971/6c2073240d1e/nanomaterials-11-00211-g001.jpg

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本文引用的文献

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Nano Lett. 2017 Jun 14;17(6):3738-3743. doi: 10.1021/acs.nanolett.7b01068. Epub 2017 May 8.
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