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堆叠顺序和面内应变对双层GeSe电子性质的影响。

Effect of stacking order and in-plane strain on the electronic properties of bilayer GeSe.

作者信息

Mao Yuliang, Xu Congshen, Yuan Jianmei, Zhao Hongquan

机构信息

Hunan Key Laboratory for Micro-Nano Energy Materials and Devices, School of Physics and Optoelectronic, Xiangtan University, Hunan 411105, China.

出版信息

Phys Chem Chem Phys. 2018 Mar 7;20(10):6929-6935. doi: 10.1039/c7cp07993a.

Abstract

Germanium selenide as a new layered material is promising for nanoelectronic applications due to its unique optoelectronic properties and tunable band gap. In this study, based on density functional theory, we systematically investigated the structure, stability, and electronic properties of bilayer germanium selenide with four different stacking orders (namely AA-, AB-, AC- and AD-stacking). The obtained results indicated that the band gap is dependent on the stacking order with an indirect band gap for AA- and AC-stacking and direct band gap for AB- and AD-stacking. In addition, we also found that the band gap of the GeSe bilayer with different stacking orders can be tuned by in-plane strain. The transition between the direct to indirect band gap or semiconductor to metal is tunable. In particular, the direct band gap of the AB-stacking germanium selenide bilayer can be tuned in a wide energy range under applied strain along the armchair direction.

摘要

硒化锗作为一种新型层状材料,因其独特的光电特性和可调节的带隙,在纳米电子应用方面具有广阔前景。在本研究中,基于密度泛函理论,我们系统地研究了具有四种不同堆叠顺序(即AA-、AB-、AC-和AD-堆叠)的双层硒化锗的结构、稳定性和电子特性。所得结果表明,带隙取决于堆叠顺序,AA-和AC-堆叠为间接带隙,AB-和AD-堆叠为直接带隙。此外,我们还发现,具有不同堆叠顺序的GeSe双层的带隙可通过面内应变进行调节。直接带隙与间接带隙之间或半导体与金属之间的转变是可调节的。特别是,沿扶手椅方向施加应变时,AB-堆叠的硒化锗双层的直接带隙可在很宽的能量范围内进行调节。

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