Department of Mechanical Engineering, Eindhoven University of Technology, P.O. Box 513, 5600MB, Eindhoven, The Netherlands.
Ultramicroscopy. 2018 Apr;187:144-163. doi: 10.1016/j.ultramic.2018.01.002. Epub 2018 Feb 3.
High resolution scanning electron microscopy (HR-SEM) is nowadays very popular for different applications in different fields. However, SEM images may exhibit a considerable amount of imaging artifacts, which induce significant errors if the images are used to measure geometrical or kinematical fields. This error is most pronounced in case of full field deformation measurements, for instance by digital image correlation (DIC). One family of SEM artifacts result from positioning errors of the scanning electron beam, creating artifactual shifts in the images perpendicular to the scan lines (scan line shifts). This leads to localized distortions in the displacement fields obtained from such images, by DIC. This type of artifacts is corrected here using global DIC (GDIC). A novel GDIC framework, considering the nonlinear influence of artifacts in the imaging system, is introduced for this purpose. Using an enriched regularization in the global DIC scheme, based on an error function, the scan line shift artifacts are captured and eliminated. The proposed methodology is demonstrated in virtually generated and deformed images as well as real SEM micrographs. The results confirm the proper detection and elimination of this type of SEM artifacts.
高分辨率扫描电子显微镜(HR-SEM)如今在不同领域的各种应用中非常流行。然而,扫描电镜图像可能会呈现出相当数量的成像伪影,如果这些图像被用于测量几何或运动学场,会导致显著的误差。如果是全场变形测量,例如数字图像相关(DIC),则这种误差最为明显。一类 SEM 伪影是由于扫描电子束的定位误差引起的,在垂直于扫描线的方向上产生图像的人为移位(扫描线移位)。这会导致通过 DIC 从这些图像中获得的位移场出现局部变形。本文使用全局数字图像相关(GDIC)对此类伪影进行校正。为此目的,引入了一种考虑成像系统中伪影的非线性影响的新型 GDIC 框架。通过在全局 DIC 方案中基于误差函数的丰富正则化,捕获并消除了扫描线移位伪影。所提出的方法在虚拟生成和变形图像以及真实的 SEM 显微照片中进行了验证。结果证实了这种 SEM 伪影的正确检测和消除。