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磁控溅射沉积的Pt/MgO/Ta/Ru结构中的单极非易失性电阻开关

Unipolar Nonvolatile Resistive Switching in Pt/MgO/Ta/Ru Structures Deposited by Magnetron Sputtering.

作者信息

Guerra L M, Dias C, Pereira J, Lv H, Cardoso S, Freitas P P, Ventura J

出版信息

J Nanosci Nanotechnol. 2017 Jan;17(1):564-67. doi: 10.1166/jnn.2017.12333.

Abstract

The recent realization of memristors, nanodevices exhibiting non-volatile resistive switching, has sparked tremendous interest for applications in fields such as nonvolatile memories. Here we report unipolar resistive switching in Pt/MgO/Ta/Ru structures, with an oxide barrier thickness of only 15 nm. No electroforming process was required to achieve resistive switching and an ohmic conduction mechanism is associated with the ON state. We observed an inverse dependence of the ON state resistance on the SET current compliance and average values of 1.61 V and 1.38 V for the SET and RESET voltages, respectively. We show the stability of the switching for over 40 cycles and a clear separation of the ON (10¹ Ω) and OFF (10² Ω) states during at least 10⁴ s.

摘要

忆阻器这种呈现非易失性电阻开关特性的纳米器件最近的实现,引发了人们对其在非易失性存储器等领域应用的极大兴趣。在此我们报告在Pt/MgO/Ta/Ru结构中实现的单极电阻开关,其氧化物势垒厚度仅为15纳米。实现电阻开关无需电形成过程,且导通状态与欧姆传导机制相关。我们观察到导通状态电阻与设置电流合规性呈反比,设置电压和复位电压的平均值分别为1.61伏和1.38伏。我们展示了开关在超过40个周期内的稳定性,以及在至少10⁴秒内导通(10¹Ω)和关断(10²Ω)状态的清晰分离。

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