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纳秒脉冲激光沉积制备的ZnSb薄膜的热电分析

Thermoelectric Analysis of ZnSb Thin Films Prepared by ns-Pulsed Laser Deposition.

作者信息

Bellucci A, Mastellone M, Mezzi A, Kaciulis S, Polini R, Medici L, Trucchi D M

出版信息

J Nanosci Nanotechnol. 2017 Mar;17(3):1564-570. doi: 10.1166/jnn.2017.13732.

Abstract

Zinc antimonide (ZnSb) is a promising thermoelectric material for the temperature range 300– 600 K. ZnSb thin films were prepared by nanosecond Pulsed Laser Deposition (PLD) to evaluate the performance of nanostructured films for thermoelectric conversion by the determination of the Power Factor. A study of the influence of structural, compositional and thermoelectric properties of thin films is reported as a function of different deposition parameters, such as repetition rate, pulse energy, and substrate temperature. The evaluation of a thin film ZnSb compound with excess Sb has been performed to verify the variation of the thermoelectric properties. The obtained results are reported and discussed in the 300–600 K temperature range.

摘要

锑化锌(ZnSb)是一种适用于300 - 600K温度范围的很有前景的热电材料。通过纳秒脉冲激光沉积(PLD)制备了ZnSb薄膜,以通过测定功率因数来评估纳米结构薄膜用于热电转换的性能。报告了薄膜的结构、成分和热电性能的影响作为不同沉积参数(如重复频率、脉冲能量和衬底温度)的函数的研究。对含过量Sb的ZnSb化合物薄膜进行了评估,以验证热电性能的变化。在300 - 600K温度范围内报告并讨论了所得结果。

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