Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany.
Department of Physics and Technology, University of Bergen, Allégaten 55, 5007 Bergen, Norway.
Phys Rev Lett. 2018 Jun 1;120(22):226101. doi: 10.1103/PhysRevLett.120.226101.
A chemically stable bilayers of SiO_{2} (2D silica) is a new, wide band gap 2D material. Up till now graphene has been the only 2D material where the bending rigidity has been measured. Here we present inelastic helium atom scattering data from 2D silica on Ru(0001) and extract the first bending rigidity, κ, measurements for a nonmonoatomic 2D material of definable thickness. We find a value of κ=8.8 eV±0.5 eV which is of the same order of magnitude as theoretical values in the literature for freestanding crystalline 2D silica.
SiO_{2}（二维硅）的化学稳定双层是一种新型的宽带隙二维材料。到目前为止，只有石墨烯是已经测量过弯曲刚度的二维材料。在这里，我们呈现了来自二维硅在 Ru(0001)上的非弹性氦原子散射数据，并提取了第一个定义厚度的非单原子二维材料的弯曲刚度 κ 的测量值。我们发现 κ=8.8 eV±0.5 eV，这与文献中自由态结晶二维硅的理论值具有相同的数量级。
