School of Physics, Hangzhou Normal University, No. 2318, Yuhangtang Road, Hangzhou, 311121 Zhejiang, China.
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany.
Chem Rev. 2022 Jul 13;122(13):11172-11246. doi: 10.1021/acs.chemrev.1c00995. Epub 2022 Jun 22.
Two-dimensional (2D) ultrathin silica films have the potential to reach technological importance in electronics and catalysis. Several well-defined 2D-silica structures have been synthesized so far. The silica bilayer represents a 2D material with SiO stoichiometry. It consists of precisely two layers of tetrahedral [SiO] building blocks, corner connected via oxygen bridges, thus forming a self-saturated silicon dioxide sheet with a thickness of ∼0.5 nm. Inspired by recent successful preparations and characterizations of these 2D-silica model systems, scientists now can forge novel concepts for realistic systems, particularly by atomic-scale studies with the most powerful and advanced surface science techniques and density functional theory calculations. This Review provides a solid introduction to these recent developments, breakthroughs, and implications on ultrathin 2D-silica films, including their atomic/electronic structures, chemical modifications, atom/molecule adsorptions, and catalytic reactivity properties, which can help to stimulate further investigations and understandings of these fundamentally important 2D materials.
二维(2D)超薄硅薄膜在电子学和催化领域具有达到技术重要性的潜力。迄今为止,已经合成了几种明确的 2D 硅结构。二氧化硅双层代表了具有 SiO 化学计量的 2D 材料。它由精确的两层四面体[SiO]构建块组成,通过氧桥角连接,从而形成具有约 0.5nm 厚度的自饱和氧化硅片。受最近对这些 2D 硅模型系统的成功制备和表征的启发,科学家现在可以为实际系统提出新的概念,特别是通过最强大和先进的表面科学技术和密度泛函理论计算进行原子尺度研究。这篇综述为超薄 2D 硅薄膜提供了这些最新进展、突破和影响的坚实介绍,包括它们的原子/电子结构、化学修饰、原子/分子吸附和催化反应性特性,这有助于激发对这些基本重要的 2D 材料的进一步研究和理解。