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CrX(X = I,Br)/二维金属接触中费米能级钉扎的抑制和宽范围可调肖特基势垒

Suppressed Fermi Level Pinning and Wide-Range Tunable Schottky Barrier in CrX (X = I, Br)/2D Metal Contacts.

作者信息

Hu Yanmei, Hu Xiaohui, Wang Yifeng, Lu Chunhua, Krasheninnikov Arkady V, Chen Zhongfang, Sun Litao

机构信息

College of Materials Science and Engineering, Nanjing Tech University, Nanjing 211816, China.

Jiangsu Collaborative Innovation Center for Advanced Inorganic Function Composites, Nanjing Tech University, Nanjing 211816, China.

出版信息

J Phys Chem Lett. 2023 Mar 23;14(11):2807-2815. doi: 10.1021/acs.jpclett.3c00354. Epub 2023 Mar 13.

Abstract

CrX (X = I, Br) monolayers exhibit outstanding performance in spintronic devices. However, the Schottky barrier at the CrX/electrode interface severely impedes the charge injection efficiency. Herein, we propose two-dimensional (2D) metals as electrodes to form van der Waals (vdW) contact with CrX monolayers and systematically explore the contact properties of CrX/metal by density functional theory (DFT) calculations. The results demonstrate that the strongly suppressed Fermi level pinning (FLP) effect and the wide-range tunable Schottky barrier can be achieved in CrX/metal contacts. Specifically, the n-type and the p-type Schottky contacts can be realized in CrX/metal contacts by choosing 2D metal electrodes with different work functions. Importantly, the pinning factors for CrX/metal contacts are exceptionally larger than other commonly studied 2D semiconductors, indicating the strongly suppressed FLP in CrX/metal contacts, which leads to the wide-range tunable Schottky barrier. Our findings provide guidance to the choice of electrodes and promote the development of CrX-based spin devices.

摘要

卤化铬(X = I,Br)单层在自旋电子器件中表现出优异的性能。然而,卤化铬/电极界面处的肖特基势垒严重阻碍了电荷注入效率。在此,我们提出使用二维(2D)金属作为电极与卤化铬单层形成范德华(vdW)接触,并通过密度泛函理论(DFT)计算系统地研究卤化铬/金属的接触特性。结果表明,在卤化铬/金属接触中可以实现强抑制的费米能级钉扎(FLP)效应和宽范围可调的肖特基势垒。具体而言,通过选择具有不同功函数的二维金属电极,可以在卤化铬/金属接触中实现n型和p型肖特基接触。重要的是,卤化铬/金属接触的钉扎因子比其他常用研究的二维半导体大得多,这表明卤化铬/金属接触中的FLP得到了强烈抑制,从而导致了宽范围可调的肖特基势垒。我们的研究结果为电极的选择提供了指导,并促进了基于卤化铬的自旋器件的发展。

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