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SnTe 超薄薄膜中铁电性增强的固有起源。

Intrinsic Origin of Enhancement of Ferroelectricity in SnTe Ultrathin Films.

机构信息

Key Laboratory of Computational Physical Sciences (Ministry of Education), State Key Laboratory of Surface Physics, and Department of Physics, Fudan University, Shanghai 200433, People's Republic of China.

Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, People's Republic of China.

出版信息

Phys Rev Lett. 2018 Jul 13;121(2):027601. doi: 10.1103/PhysRevLett.121.027601.

Abstract

Previous studies showed that, as ferroelectric films become thinner, their Curie temperature (T_{c}) and polarization below T_{c} both typically decrease. In contrast, a recent experiment [Chang et al., Science 353, 274 (2016)SCIEAS0036-807510.1126/science.aad8609] observed that atomic-thick SnTe films have a higher T_{c} than their bulk counterpart, which was attributed to extrinsic effects. We find, using first-principles calculations, that the 0-K energy barrier for the polarization switching (which is a quantity directly related to T_{c}) is higher in most investigated defect-free SnTe ultrathin films than that in bulk SnTe, and that the 5-unit-cell (UC) SnTe thin film has the largest energy barrier as a result of an interplay between hybridization interactions and Pauli repulsions. Further simulations, employing a presently developed effective Hamiltonian, confirm that freestanding, defect-free SnTe thin films have a higher T_{c} than bulk SnTe, except for the 1-UC case. Our work, therefore, demonstrates the possibility to intrinsically enhance ferroelectricity of ultrathin films by reducing their thickness.

摘要

先前的研究表明,随着铁电薄膜变薄,其居里温度(T_c)和低于 T_c 的极化通常都会降低。相比之下,最近的一项实验[Chang 等人,《科学》353, 274 (2016)SCIEAS0036-807510.1126/science.aad8609]观察到,原子层厚的 SnTe 薄膜具有比其体相更高的 T_c,这归因于外部效应。我们通过第一性原理计算发现,在大多数研究的无缺陷 SnTe 超薄薄膜中,极化反转的 0-K 能量势垒(这是一个与 T_c 直接相关的量)高于体相 SnTe 的能量势垒,而 5 个单元(UC)的 SnTe 薄膜由于杂化相互作用和泡利排斥之间的相互作用而具有最大的能量势垒。进一步的模拟,采用目前开发的有效哈密顿量,证实了除了 1-UC 情况外,无缺陷的自由支撑 SnTe 薄膜具有比体相 SnTe 更高的 T_c。因此,我们的工作表明,通过减小薄膜的厚度,有可能从根本上增强超薄薄膜的铁电性。

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